2006
DOI: 10.1117/12.654839
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An investigation of the removal of 1-Methyl-2-Pyrrolidinone (NMP)

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Cited by 2 publications
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“…To this end, compounds such as NMP, amines, and siloxanes have been openly discussed in the literature through the years and have been addressed previously by the authors and their colleagues. [3][4][5]8,9 However, even though many other organics have been found in key locations within the cleanroom, some at significantly elevated concentrations, they have not been reported as creating any significant issues, until recently.…”
Section: Introductionmentioning
confidence: 97%
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“…To this end, compounds such as NMP, amines, and siloxanes have been openly discussed in the literature through the years and have been addressed previously by the authors and their colleagues. [3][4][5]8,9 However, even though many other organics have been found in key locations within the cleanroom, some at significantly elevated concentrations, they have not been reported as creating any significant issues, until recently.…”
Section: Introductionmentioning
confidence: 97%
“…Over the years, the AMC contaminants of greatest concern in photolithography applications have changed dramatically. Since the early 1990s the focus of AMC filtration has ranged from ammonia (NH3), 1,2 n-methyl-2-pyrrolidinone (NMP), 3,4 amines, 5 sulfur dioxide (SO2) 6 and acid gases in general, 7 to siloxanes (HMDS, HMDSO, and TMS). 8,9 The issues associated with these contaminants have ranged from photoresist issues (e.g.…”
Section: Introductionmentioning
confidence: 99%