An investigation of a new generation of progressive mask defects on the pattern side of advanced photomasks

Bhattacharyya, Kaustuve; Eickhoff, Mark; Grenon, Brian J.; Ma, Mark; Pas, Sylvia

doi:10.1117/12.617083

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“…Figure 1 provides a description of a typical photomask with pellicle and the direction of the exposure. While there are several types of haze-cyanuric acid and ammonium oxalate are the most common-these compounds have not been detected on the back side surface of reticles 4 . The only haze detected has been ammonium sulfate.…”

Section: Introductionmentioning

confidence: 99%

Back side photomask haze revisited

Grenon¹,

Kishkovich

2009

SPIE Proceedings

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Back (glass) side haze on photomasks has been previously reported and continues to present problems in many fabs throughout the industry 1 . While some process changes have resulted in the reduction in both the occurrences and rate at which back side haze forms; proper handling and storage of reticles remains paramount in protecting all surfaces on the reticle from haze formation. We will describe again the basic mechanisms for haze formation and how proper storage can result in significantly reducing the risk of haze formation during storage and use in the fab.

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Section: Introductionmentioning

confidence: 99%