An investigation by electron spectroscopy for chemical analysis of chemical treatments of the (100) surface of n-type InP epitaxial layers for Langmuir film deposition

Clark, D. T.; Fok, Tomasz; Roberts, G.G.; Sykes, Robert

doi:10.1016/0040-6090(80)90367-3

Cited by 148 publications

(83 citation statements)

References 15 publications

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“…The transition from P 2 O 5 to KTiOPO 4 should decrease the binding energies of phosphorus and the direction of shift for titanium is ambiguous. The reported binding energies of the P 2p level in P 2 O 5 are 135.3 21 and 135.2 eV. 22 In comparison with the value measured in KTP (see Table 1), the shift is negative, as expected.…”

Section: Intensitysupporting

confidence: 57%

Study of KTiOPO₄ surface by x‐ray photoelectron spectroscopy and reflection high‐energy electron diffraction

Atuchin

Kesler

Maklakova

et al. 2002

Surface & Interface Analysis

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Structural and electronic properties of the as-grown (011) crystal face and the mechanically polished (001) surface of potassium titanyl phosphate (KTiOPO 4 or KTP) have been investigated by core-level x-ray photoelectron spectroscopy and reflection high-energy electron diffraction (RHEED). With XPS analysis the original element binding energies, Auger parameters for K 2p 3/2 and P 2p core levels, relative element contents and valence band structure have been determined for both crystal cuts. A great depletion of O, K and P in the (011) face with respect to the (001) surface was discovered on comparison of element peak areas. The Ti 2p 3/2 peak areas were virtually the same for both cuts investigated. The relative element contents at the (001) surface were very close to the formal composition of KTiOPO 4 , so it is optimal to use the polished (001) KTP surface cleaned by ion bombardment and the Ti 2p 3/2 core level as standards for determination of the chemical composition of doped crystal surfaces.

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Section: Intensitysupporting

confidence: 57%

Study of KTiOPO₄ surface by x‐ray photoelectron spectroscopy and reflection high‐energy electron diffraction

Atuchin

Kesler

Maklakova

et al. 2002

Surface & Interface Analysis

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“…7. Besides In,O, InO(0H) is also possible, as suggested by Clark et al 16 These two components decrease towards the surface. At the outer side of the oxide layer we also expect In(OH),, suggested because of the atmospheric humidity during the oxidation process.…”

Section: Oxidized Surfacesmentioning

confidence: 84%

XPS investigation of oxide films on InP(100)

Hofmann

Streubel

Meisel

1988

Surface & Interface Analysis

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The effect of chemical etching and the oxide growth on the etched surfaces on n-and pInP(100) have been studied using x-ray photoelectron spectroscopy. The samples were etched in HCI (1 molar in methanol) and then annealed at 650 K in a vacuum for 1 hour. After this procedure both samples were oxidized in air at room temperature for a long time. The stoichiometry of the oxide layer was determined by angleresolved analysis of core level spectra.The surface treatment leads to an indium-rich surface. After annealing the In/P atomic ratios amount to 2.0 and 1.5 for n-InP and pInP, respectively. Most of the oxygen on the surface after etching and annealing is presented as In,O, and In(OH), .Within the oxide layers of the air-oxidized samples the In/P atomic ratios vary from 2.5 to 3.7 for both n-and pInP showing a depletion of P during the oxidation. From angledependent measurements it is concluded that the oxide layers consist of InPO, and In(OH), whereas the outer layer is InP0,-rich. The presence of In,O, can be suggested in the oxide layer of n-InP only. The oxidized ptype sample contains more oxygen than the n-type one.

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“…Our observed BO/NBO of 0.5 at a kinetic energy of 960 eV indicates the presence mostly of long-chain linear polyphosphate with small amounts of short chain and ultraphosphate, and the BO/NBO ratio of 0.73 at a kinetic energy of 560 eV indicates that there is substantial Zn ultraphosphate in the top 5 nm of the film in agreement with the large P/Zn of [3 at the same kinetic energy. As for the organophosphate, the O 1s binding energy for an organophosphate (R 3 PO 4 ), with only NBO oxygens, is very similar (532.1 eV) [20] to the above NBO for metal polyphosphates and therefore if any significant amount of organophosphates are present will be reflected by a decrease in the BO/NBO ratio. Such a species is probably the cause of the lower BO/NBO ratio at 700 eV, where the analysis depth is *2 nm.…”

Section: Synchrotron Radiation-x-ray Photoelectronmentioning

confidence: 89%

“…In contrast, for an ultraphosphate such as ZnP 4 O 11 (P/Zn = 4) [16], P/Zn is greater than 2. Another possible contributor to the antiwear film is organophosphates of the type R 3 PO 4 [20] (R = aryl, or alkyl in this case) (containing no Zn) and could yield a very large P/ Zn ratio.…”

Section: Synchrotron Radiation-x-ray Photoelectronmentioning

confidence: 99%

Resolving the Chemical Variation of Phosphates in Thin ZDDP Tribofilms by X-ray Photoelectron Spectroscopy Using Synchrotron Radiation: Evidence for Ultraphosphates and Organic Phosphates

et al. 2010

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X-ray photoelectron spectroscopy using a synchrotron source (SR-XPS) with variable photon energy has been used to non-destructively elucidate the variations in surface chemistry from *5 nm to *10 nm into the tribofilm derived from zinc dialkyldithiophosphate (ZDDP) in a mineral oil under boundary lubrication conditions. The elemental ratio of P/Zn and ''bridging'' oxygen (BO)/''nonbridging'' oxygen (NBO) decrease as a function of distance from the top surface of the film, suggesting a decrease of the polyphosphate chain-length into the film, as shown in many recent XPS and XANES studies. More importantly, the measured P/Zn ratio of *3, the BO/NBO ratios of [0.5, the P 2p spectra, and the absence of other balancing cations such as iron, show the first strong evidence for an ultrapolyphosphate (such as ZnP 4 O 11 ), organophosphates along with other Zn polyphosphates. The existence of ultraphosphates and/or organophosphates in this film appears to be the long-awaited answer to the apparent deficiency of cations in these antiwear films.

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An investigation by electron spectroscopy for chemical analysis of chemical treatments of the (100) surface of n-type InP epitaxial layers for Langmuir film deposition

Cited by 148 publications

References 15 publications

Study of KTiOPO₄ surface by x‐ray photoelectron spectroscopy and reflection high‐energy electron diffraction

Study of KTiOPO₄ surface by x‐ray photoelectron spectroscopy and reflection high‐energy electron diffraction

XPS investigation of oxide films on InP(100)

Resolving the Chemical Variation of Phosphates in Thin ZDDP Tribofilms by X-ray Photoelectron Spectroscopy Using Synchrotron Radiation: Evidence for Ultraphosphates and Organic Phosphates

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An investigation by electron spectroscopy for chemical analysis of chemical treatments of the (100) surface of n-type InP epitaxial layers for Langmuir film deposition

Cited by 148 publications

References 15 publications

Study of KTiOPO4 surface by x‐ray photoelectron spectroscopy and reflection high‐energy electron diffraction

Study of KTiOPO4 surface by x‐ray photoelectron spectroscopy and reflection high‐energy electron diffraction

XPS investigation of oxide films on InP(100)

Resolving the Chemical Variation of Phosphates in Thin ZDDP Tribofilms by X-ray Photoelectron Spectroscopy Using Synchrotron Radiation: Evidence for Ultraphosphates and Organic Phosphates

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Study of KTiOPO₄ surface by x‐ray photoelectron spectroscopy and reflection high‐energy electron diffraction

Study of KTiOPO₄ surface by x‐ray photoelectron spectroscopy and reflection high‐energy electron diffraction