An innovative platform for high-throughput high-accuracy lithography using a single wafer stage

Shibazaki, Yuichi; Kohno, Hirotaka; Hamatani, Masato

doi:10.1117/12.813386

Cited by 12 publications

(13 citation statements)

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“…Additional encoder heads (not shown) are used to measure displacement in Z and rotation around Y and rotation around X. This type of 2D encoder measurement has also been shown to have much lower noise and higher repeatability than the laser interferometer solution [196].…”

Section: Semiconductor Manufacturing Equipmentmentioning

confidence: 98%

Measurement technologies for precision positioning

et al. 2015

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Section: Semiconductor Manufacturing Equipmentmentioning

confidence: 98%

Measurement technologies for precision positioning

et al. 2015

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“…In the Streamlign platform, the reticle stage, wafer stage, and the projection lens are protected from vibrations by an effective isolation structure, which includes reticle stage isolation and Sky Hook isolation [1] . Regarding motion control, we introduced a new method called Multi-shot Iterative Learning Control (MILC) [5] , which can reduce errors in the stage trajectory by iterative motion learning.…”

Section: Cdu : Line 25 Space 33 (3σ [Nm])mentioning

confidence: 99%

“…To meet these requirements, Nikon has developed NSR-S620D based on what we call the Streamlign platform [1] . Figure 2 represents an overview of S620D, which is equipped with a newly developed projection lens of 1.35 NA.…”

Section: Introductionmentioning

confidence: 99%

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Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation

et al. 2010

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Currently, it is considered that one of the most favorable options for the 32 nm HP node is pitch-splitting double patterning, which requires the lithography tool to achieve high productivity and high overlay accuracy simultaneously. In the previous work [1] , we described the concepts and the technical features of Nikon's immersion scanner based on our newly developed platform, Streamlign, designed for 2nm overlay, 200wph throughput, and short setup time. In this paper, we present the latest actual performance of S620D with the Streamlign platform.Owing to the high repeatability of our new encoder metrology system, Bird's Eye Control, and Stream Alignment, S620D achieves less than 2 nm overlay accuracy, less than 15nm focus accuracy, and successful 32 and 22 nm L/S pitchsplitting double patterning exposures. Furthermore, the results at high scanning speed up to 700 mm/s are fine and we have successfully demonstrated over 4,000 wpd throughput, which confirms the potential for high productivity. Nikon has developed this Streamlign as an optimized long life platform based on the upgradable Modular 2 structure for upcoming generations. The performance of S620D indicates the possibility of immersion extension down through the 22 nm HP node and beyond.

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“…Linear motors or ball screws are normally used for the coarse stages, but the electric motors become larger and heavier due to the high acceleration and larger stage demands, thereby increasing the generation of heat (3) . Variations in temperature have severe effects on the measurement system and lens apparatus (4) (5) , and thus precise temperature control (5) is problematic.…”

Section: Introductionmentioning

confidence: 99%

Acoustic Wave Equation Based Modeling and Collocated Side Vibration Cancellation for Pneumatic Cylinder

et al. 2018

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A pneumatic actuator has several advantages such as low heat generation, a high power-to-weight ratio, and low costs; however, it also has disadvantages such as time delays, nonlinearities, and position-dependent multiple pressure resonances. In this study, we propose a wave equation-based model, which can fit the position-dependent pressure resonances based on delay elements, taking into account the damping. Using this model, a wave cancellation filter is proposed for canceling all the resonances and anti-resonances. The effectiveness of both the model and the filter were verified through experiments.

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An innovative platform for high-throughput high-accuracy lithography using a single wafer stage

Cited by 12 publications

References 0 publications

Measurement technologies for precision positioning

Measurement technologies for precision positioning

Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation

Acoustic Wave Equation Based Modeling and Collocated Side Vibration Cancellation for Pneumatic Cylinder

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