2021
DOI: 10.1088/1361-6501/ac219a
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An imbalance aware lithography hotspot detection method based on HDAM and pre-trained GoogLeNet

Abstract: Due to the continuous shrinkage of transistor size and the ever-increasing complexity of integrated circuit design layout, great challenges arise in optical lithography-any defect on the mask will be transferred to the silicon wafer, which may lead to severe defects such as open circuit and short circuit. These defects on masks are called hotspots. Before transferring the circuit layout on the mask to the silicon wafer, the entire mask must be inspected to accurately find out the hotspots before optical lithog… Show more

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Cited by 7 publications
(4 citation statements)
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“…The proposed method takes the strategy of calculating the local density to down-sample the original pattern, thereby achieving data compression. The proposed method is different from the other methods [19,26]. On the one hand, the resolution of the down-sampled patterns is higher, which is 240 × 240 pixels.…”
Section: Data Preparation 221 Data Compressionmentioning
confidence: 81%
See 3 more Smart Citations
“…The proposed method takes the strategy of calculating the local density to down-sample the original pattern, thereby achieving data compression. The proposed method is different from the other methods [19,26]. On the one hand, the resolution of the down-sampled patterns is higher, which is 240 × 240 pixels.…”
Section: Data Preparation 221 Data Compressionmentioning
confidence: 81%
“…In recent years, transfer learning has developed rapidly and has been widely used [22][23][24]. A transfer-learning-based hotspot-detection method has begun to emerge [25,26]. Accuracy, recall, precision, and F1 score are commonly used as evaluation indicators for machine learning [27].…”
Section: Introductionmentioning
confidence: 99%
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