An IDEF/sub 0/ representation of the instructional system development (ISD) process-why it works

Haines, L.A.; Evers, Ken

doi:10.1109/naecon.1990.112871

Cited by 5 publications

(2 citation statements)

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“…The basic element of an IDEF0 model is called a function block, which can be decomposed into more detailed sub-function blocks further down the hierarchy, while the lower-level function blocks describe the supporting sub-systems. Further information about IDEF0 can be found in references [9,10].…”

Section: Idef0 Model Of Photolithography Processmentioning

confidence: 99%

A simulation model to characterize the photolithography process of a semiconductor wafer fabrication

Arisha

Young

Baradie

2004

Journal of Materials Processing Technology

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The pressures on semiconductor manufacturers due to cost considerations, rapid growth of process technology, quality constraints, feature size reduction, and increasingly complex products are requiring ever higher efficiency from manufacturing facilities. The complexity of manufacturing high capacity semiconductor devices means that it is impossible to analyze the process control parameters and the production configurations using traditional analytical models. There is, therefore, an increasing need for effective models of each manufacturing process, characterizing and analyzing the process in detail, allowing the effect of changes in the production environment on the process to be predicted. The photolithography process is one of the most complex processes in semiconductor manufacturing. Using state-of-the-art computer simulation and a structured modeling methodology a generic model of photolithography flexible manufacturing cells has been developed and used to mimic the actual performance of the tools. Comparison of the output from the model with data from the plant shows the quality of the model. This paper discusses the technique used to develop the simulation model and includes a details on the structured modeling approach employed to develop reusable generic model for optimizing photolithography process parameters.

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Section: Idef0 Model Of Photolithography Processmentioning

confidence: 99%

A simulation model to characterize the photolithography process of a semiconductor wafer fabrication

Arisha

Young

Baradie

2004

Journal of Materials Processing Technology

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show abstract

“…IDEF 0 is a functional modeling technique. The principle goal of IDEF 0 is to provide a structured approach for breaking a complex system into more elemental components that are 7 . Each function within a system can be thought of as a process in which mechanisms transform the system from an initial state to a transformed state subject to certain controls.…”

Section: Qfd Overviewmentioning

confidence: 99%

Using The Integration Of Qfd And Idef Techniques For Mobile Wireless Classroom Process Improvement

Doolen¹,

Chompu-inwai²

2005 Annual Conference Proceedings

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A systems approach to semiconductor optimization

Newnes

Mileham

Doniavi

2001

IEEE Trans. Electron. Packag. Manufact.

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An IDEF/sub 0/ representation of the instructional system development (ISD) process-why it works

Cited by 5 publications

References 0 publications

A simulation model to characterize the photolithography process of a semiconductor wafer fabrication

A simulation model to characterize the photolithography process of a semiconductor wafer fabrication

Using The Integration Of Qfd And Idef Techniques For Mobile Wireless Classroom Process Improvement

A systems approach to semiconductor optimization

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