2022
DOI: 10.1016/j.chaos.2022.112247
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An experimental and simulation study of the role of thermal effects on variability in TiN/Ti/HfO2/W resistive switching nonlinear devices

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Cited by 10 publications
(6 citation statements)
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“…The values of V set and V reset are similar, although the shape of the I – V curves is different from each other (see the logarithmic version of the plots in the corresponding insets). A traditional variability analysis of V set and V reset (as those reported in refs and ) would indicate that the cycle-to-cycle variability is zero. However, using our advanced holistic approach, we can quantify the variability accounting for all the data in the I – V curves.…”
Section: Results and Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…The values of V set and V reset are similar, although the shape of the I – V curves is different from each other (see the logarithmic version of the plots in the corresponding insets). A traditional variability analysis of V set and V reset (as those reported in refs and ) would indicate that the cycle-to-cycle variability is zero. However, using our advanced holistic approach, we can quantify the variability accounting for all the data in the I – V curves.…”
Section: Results and Discussionmentioning
confidence: 99%
“…The operation of memristive nonvolatile memories made of metal oxide materials, often termed resistive random access memories (RRAM), is characterized by resistive switching (RS) where charge conduction is linked to internal ion movement and concurrent redox reactions in the dielectric and dielectric/electrode interfaces, which can lead to different resistive states in both a digital and an analog context. Academic studies have shown devices with a good endurance above >10 10 cyclesalthough there is no commercial RRAM with an endurance higher than 10 7 cyclesas well as long data retention time above 10 years and low write energy down to ∼0.1 pJ . Moreover, their technology is complementary metal–oxide–semiconductor (CMOS) compatible, and the devices can be built in compact crossbar structures (with 4 F 2 footprint, where F is the minimum technology haft-pitch) …”
Section: Introductionmentioning
confidence: 99%
“…[ 128,129 ] As reported in previous sections, variability is always present in RRAMs due to their inherent stochastic behavior; this effect occurs for the different technologies employed to fabricate these devices [ 3,6,7,34,138–140 ] and for different operation conditions where temperature and external fields (e.g., magnetic) are changed. [ 141,142 ] In this respect, there is a clear need to model variability to make EDA tools suitable for IC design. In this section and the following ones, we will focus on the C2C variability by analyzing RS parameters such as V set , V reset , and the device resistances at the LRS and HRS.…”
Section: Variability Physical Modelsmentioning
confidence: 99%
“…Consequently, exposure to aggressive environments not only affects data retention lifetime but also impairs device operation, leading to the degradation of resistance ratios . Moreover, since the basic operation of memristors involves a limited number of ion migrations, there can be variabilities in the movement of those ions, which can lead to differences in device resistance . The LRS in conductive filament (CF)-based devices is determined by the presence of a percolation path between the electrodes and the data retention is the time this CF takes to vanish under ambient conditions, leading the device to the HRS.…”
Section: Introductionmentioning
confidence: 99%
“… 18 Moreover, since the basic operation of memristors involves a limited number of ion migrations, there can be variabilities in the movement of those ions, which can lead to differences in device resistance. 19 The LRS in conductive filament (CF)-based devices is determined by the presence of a percolation path between the electrodes and the data retention is the time this CF takes to vanish under ambient conditions, 14 leading the device to the HRS. Since the data retention depends on the CF stability, it also depends on the compliance current used for the forming or SET process that determines the CF size.…”
Section: Introductionmentioning
confidence: 99%