2013
DOI: 10.1016/j.mssp.2013.06.012
|View full text |Cite
|
Sign up to set email alerts
|

An evaluation of the deposition parameters for indium sulfide (In2S3) thin films using the grey-based Taguchi method

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

1
8
0

Year Published

2014
2014
2022
2022

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 21 publications
(9 citation statements)
references
References 23 publications
1
8
0
Order By: Relevance
“…The estimated band gap values are listed in Table II. These results are in good agreement with previous works related to In 2 S 3 thin films [3,6,7]. The complex refractive indexes of the β-In 2 S 3 thin films are described as follows:…”
Section: Resultssupporting
confidence: 92%
See 1 more Smart Citation
“…The estimated band gap values are listed in Table II. These results are in good agreement with previous works related to In 2 S 3 thin films [3,6,7]. The complex refractive indexes of the β-In 2 S 3 thin films are described as follows:…”
Section: Resultssupporting
confidence: 92%
“…The β-In 2 S 3 exist in three crystallographic modifications α, β and γ. Cubic structure of β-In 2 S 3 is a stable phase at room temperature. Thin films of this material have been prepared by different methods such as spray ions layer gas reaction (ILGAR) [5], radio frequency (RF) magnetron sputtering [6], chemical spray pyrolysis [7], sol-gel [8] and chemical bath deposition (CBD) [9].…”
Section: Introductionmentioning
confidence: 99%
“…A number of compound semiconducting materials like In 2 S 3 , In 2 Se 3 , InZnSe x , ZnO, ZnS, ZnSe are studied as a substitute to the traditional CdS buffer layer [4]. Among these, indium sulfide (In 2 S 3 ) is an important semiconductor material for optoelectronic and photovoltaic applications due to its chemical stability, wider optical band gap (2.0-2.75 eV), photoconductive behavior, high optical transmittance (480%) and controllable electrical properties [5][6][7]. It is a compound semiconductor of III-VI group and exits in three crystallographic forms in nature α-In 2 S 3 (cubic structure, stable upto 693 K), β-In 2 S 3 (spinel structure, stable upto 1027 K) and γ-In 2 S 3 (layered structure, stable above 1027 K).…”
Section: Introductionmentioning
confidence: 99%
“…Indium sulfide films have been prepared by various techniques such as chemical bath deposition (CBD) [21], radio frequency (RF) magnetron sputtering [22], SILAR [23], organometallic chemical evaporation [24], chemical spray pyrolysis (CSP) [25][26][27], thermal evaporation [28], atomic layer epitaxy [29] and novel ultrasonic method [30].…”
Section: Introductionmentioning
confidence: 99%