An electrophoretic co-deposition of metal oxides followed by in-situ copper manganese spinel synthesis on AISI-430 for application in SOFC interconnects

Norouzi, Arian; Soltanieh, M.; Rastegari, S.

doi:10.1016/j.ijhydene.2022.02.182

Cited by 16 publications

(2 citation statements)

References 59 publications

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“…However, these two methods deposit an imprecisely thickness layer, give poor layer adhesion to the substrate surface, and agglomerate materials after the solvent evaporated. The electrophoretic deposition (EPD) technique is known to have the advantages of low-temperature operation, controllable layer thickness, short formation time, simple equipment, low cost, various substrate-shape, binder-free, and high scalability potential for large dimensions. − Therefore, the EPD technique is emerging as a potential deposition method for highly ordered structure films that could replace the CVD method. − The EPD technique uses an electric field to move charged particles dispersed in a suitable solvent toward an oppositely charged electrode . This technique can be applied to any solid in particulate form with small particle sizes (<30 μm) and to colloidal suspensions. , The EPD technique can also easily control the morphology and thickness of the deposited layer by adjusting the process parameters .…”

Section: Introductionmentioning

confidence: 99%

Simulation and Verification of the Direct Current Electric Field on Fabricating High Porosity f-MWCNTs Thin Films by Electrophoretic Deposition Technique

Nguyen

Vuong

et al. 2023

Langmuir

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Electrophoretic deposition (EPD) is the potential process in high porosity thin films’ fabrication or complex surface coating for perovskite photovoltaics. Here, the electrostatic simulation is introduced to optimize the EPD cell design for the cathodic EPD process based on functionalized multiwalled carbon nanotubes (f-MWCNTs). The similarity between the thin film structure and the electric field simulation is evaluated by scanning electron microscopy (SEM) and atomic force microscopy (AFM) results. The thin-film surface at the edge has a higher roughness (Ra) compared to the center position (16.48 > 10.26 nm). The f-MWCNTs at the edge position tend to be twisted and bent due to the torque of the electric field. The Raman results show that f-MWCNTs with low defect density are more easily to be positively charged and deposited on the ITO surface. The distribution of oxygen and aluminum atoms in the thin film reveals that the aluminum atoms tend to have adsorption/electrostatic attraction to the interlayer defect positions of f-MWCNTs without individually depositing onto the cathode. Finally, this study can reduce the cost and time for the scale-up process by optimizing the input parameters for the complete cathodic electrophoretic deposition process through electric field inspection.

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Section: Introductionmentioning

confidence: 99%

Simulation and Verification of the Direct Current Electric Field on Fabricating High Porosity f-MWCNTs Thin Films by Electrophoretic Deposition Technique

Nguyen

Vuong

et al. 2023

Langmuir

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“…Recently, in the laboratory, researches have been focused on manufacturing of these coatings by electrophoretic deposition (EPD) technique [10,11]. In recent years, (EPD) is taken in to consideration in both industrial and academic sectors; not because of the versatility of this method with different materials specially compounds, but also because of its simple and cheap equipment that needed for deposition [12,13]. EPD method has been used successfully for gas diffusion electrodes [14] and sensors [12], silica thin films [15], layered ceramics [16], multi-layer composites [17], hydroxyapatite Coatings [18], layers contained carbon nanotubes [19], functionally graded ceramics [20], and piezoelectric materials [21].…”

Section: Introductionmentioning

confidence: 99%

The Effect of Surface Roughness of Inconel 738 Superalloy on the Adhesive Properties of 8YSZ Coatings Deposited by Electrophoretic Deposition (EPD)

Alikhani,

Taherizadeh,

Akbari

et al. 2023

JSMPM

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The electrophoretic deposition coating method has recently received attention as a new method for thermal barrier coating due to its advantages such as the simplicity of the method, controllability of the process, and the need for simple equipment. In this study 8 wt % yttria- stabilized zirconia was deposited on Inconel 738 substrate at room temperature by electrophoretic deposition. Before deposition, the substrates were treated by sand blasting treatment (by silica sands with different sizes) and roughness in the range of Ra=1 and Ra=3 was achieved on the substrate surfaces. The coated samples were sintered at 1100 °C temperature under controlled atmosphere (Ar atmosphere). X-Ray diffraction, scanning electron microscopy and thermal shock resistance technics were used to investigating of structural and phase properties and adhesiveness between coatings and substrates. Results from thermal shock resistance test show that by increasing roughness number, the thermal shock resistance ability first increased and then decreased. In addition, according to SEM images, increasing of roughness number, causes decrease the microcracks that creating in the coating surface. The best result was observed for coatings deposed on substrate with Ra=2.

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Recent trends in coating processes on various AISI steel substrates: A review

Kumar,

Choubey

2023

J Mater Sci

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An electrophoretic co-deposition of metal oxides followed by in-situ copper manganese spinel synthesis on AISI-430 for application in SOFC interconnects

Cited by 16 publications

References 59 publications

Simulation and Verification of the Direct Current Electric Field on Fabricating High Porosity f-MWCNTs Thin Films by Electrophoretic Deposition Technique

Simulation and Verification of the Direct Current Electric Field on Fabricating High Porosity f-MWCNTs Thin Films by Electrophoretic Deposition Technique

The Effect of Surface Roughness of Inconel 738 Superalloy on the Adhesive Properties of 8YSZ Coatings Deposited by Electrophoretic Deposition (EPD)

Recent trends in coating processes on various AISI steel substrates: A review

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