1971
DOI: 10.1016/0022-2860(71)80019-4
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An electron diffraction determination of the molecular structures of perchlorodisiloxane and methoxytrifluorosilane

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Cited by 69 publications
(21 citation statements)
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“…References: (a) Almenningen et al (1963);(b) Csakvari, Wagner, G6m6ry & Mijlhoff (1976); (c) Airey et al (1970): (d) Airey, Glidewell, Robiette & Sheldrick (1971); (e) Glidewell & Liles (1978). * Crystallographic C t symmetry.…”
Section: (B) Molecular Conformationsmentioning
confidence: 99%
“…References: (a) Almenningen et al (1963);(b) Csakvari, Wagner, G6m6ry & Mijlhoff (1976); (c) Airey et al (1970): (d) Airey, Glidewell, Robiette & Sheldrick (1971); (e) Glidewell & Liles (1978). * Crystallographic C t symmetry.…”
Section: (B) Molecular Conformationsmentioning
confidence: 99%
“…Organodisiloxanes appear to adopt either a bent configuration with an SiOSi angle of 140-160 ° or a linear configuration with SiOSi equal to 180 °. The value of the SiOSi angle has been determined by gas-phase electron diffraction for O(SiHa) 2 (Almenningen, Bastiansen, Ewing, Hedberg & Tra~tteberg, 1963), for O(SiF3) 2 (Airey, Glidewell, Rankin, Robiette, Sheldrick & Cruickshank, 1970) and for O(SiCH3) 2 (Airey, Glidewell, Robiette & Sheldrick, 1971) to be 144.1, 155.7 and 146 °, respectively. From lowtemperature X-ray diffraction analyses of single 0108-2701/86/010064-04501.50 crystals, the SiOSi angle has been found to have a value of 142.2 ° for O(SiH3) 2 and 148.8 ° for O[Si(CH3)3] 2 (Barrow, Ebsworth & Harding, 1979).…”
mentioning
confidence: 99%
“…Whereas the Si-O bond to the hexacoordinate Si atom is rather long [170.0(3) pm], this bond lengthening upon pyridine coordination gives rise to a shortening of the second Si-O bond [to 158.0(3) pm], whereas for hexachlorodisiloxane a slightly longer Si-O bond length of 159.2 ± 1.0 pm was reported (results of gas phase electron diffraction analysis). [42] The Si-O-Si angle [149.0 (2) • ] is similar to that of hexachlorodisiloxane (in the gas phase), which was determined to be 146 ± 4…”
Section: Formation Of Siloxane/silylcarbodiimide Xerogels -Cl 3 Si-osmentioning
confidence: 99%