2004
DOI: 10.1016/j.jelechem.2004.06.031
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An electrochemical impedance study of Alloy 22 in NaCl brine at elevated temperature. I. Corrosion behavior

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Cited by 79 publications
(84 citation statements)
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“…It has been demonstrated previously [41][42][43] that the PDM can readily explain the observations of the passive state on Alloy-22. Characterization work 41,[44][45][46] has demonstrated that the passive film on Alloy-22 has a distinct layered structure with the inner layer primarily comprising Cr(III) oxide, so it is assumed in the optimization that point defective Cr 2 O 3 is the principal composition of the barrier layer.…”
Section: Results and Analysis By Numerical Optimizationmentioning
confidence: 79%
“…It has been demonstrated previously [41][42][43] that the PDM can readily explain the observations of the passive state on Alloy-22. Characterization work 41,[44][45][46] has demonstrated that the passive film on Alloy-22 has a distinct layered structure with the inner layer primarily comprising Cr(III) oxide, so it is assumed in the optimization that point defective Cr 2 O 3 is the principal composition of the barrier layer.…”
Section: Results and Analysis By Numerical Optimizationmentioning
confidence: 79%
“…Other studies have used this circuit to fit the impedance data obtained with conductive metallic oxides [14][15][16]. Another electrical circuit, Rs L (R 1 Q 1 ) (R 2 Q 2 ) (R 3 Q 3 ) has also been reported, where (R 1 Q 1 ), (R 2 Q 2 ) and (R 3 Q 3 ) correspond to the capacitive and resistive contributions of the barrier layer/metal interface, the bulk barrier layer and the electrolyte/barrier layer interface, respectively [17,18].…”
Section: Introductionmentioning
confidence: 94%
“…Point defect model (PDM) [19][20][21] has been used to provide an excellent description of the passive film growth and breakdown. Using this model it can be obtained quantitative analysis of the passive film as well as an analytical expression for the flux and concentration of vacancies within the passive film.…”
Section: Mott-schottky Analysismentioning
confidence: 99%