2014 International Conference on Green Computing Communication and Electrical Engineering (ICGCCEE) 2014
DOI: 10.1109/icgccee.2014.6922280
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An efficient design and comparative analysis of low power memory cell structures

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Cited by 13 publications
(3 citation statements)
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“…The V th of a MOSFET is the gate voltage where an inversion layer forms at the interface between the insulating layer (oxide) and the substrate (body) of the transistor. Low Vth devices switch faster, and are therefore helpful on critical delay paths to minimize clock periods [13]. The consequence is that low Vth devices have considerably higher static leakage power.…”
Section: Proposed Circuit Using Mtcmos Techniquementioning
confidence: 99%
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“…The V th of a MOSFET is the gate voltage where an inversion layer forms at the interface between the insulating layer (oxide) and the substrate (body) of the transistor. Low Vth devices switch faster, and are therefore helpful on critical delay paths to minimize clock periods [13]. The consequence is that low Vth devices have considerably higher static leakage power.…”
Section: Proposed Circuit Using Mtcmos Techniquementioning
confidence: 99%
“…Reducing the total power consumption in such systems is significant since it is advantageous to maximize the run time with minimum requirements on size, battery life and weight allocated to batteries. So the most important feature to consider while designing SoC for moveable devices is low power design [13].…”
Section: Introductionmentioning
confidence: 99%
“…The usage of electronic devices and integrated circuits have increased in recent years because of technological advances [1]. The advancement of Complementary Metal Oxide Semiconductor (CMOS) process technology results in a smaller semiconductor system [22]. SRAM is the basic building block of most electronic devices, providing maximum performance and low power consumption.…”
Section: Introductionmentioning
confidence: 99%