An effective microsystem by design of a twin-plate tool for precision removal

Abstract

The low yield of ITO thin film deposition is an important factor in semiconductor production. An effective microsystem with economic viability that uses micro electroremoval as a reclaim process was developed to remove the defective ITO nanostructure coatings from the optical PET surfaces of digital paper. By establishing the reclaim process using the ultra-precise removal of the nanostructure coatings, the optoelectronic semiconductor industry can effectively reclaim defective products, minimizing both production costs and pollution. In the current experiment, a large twin-plate cathode with a small gapwidth between the cathode and the workpiece takes less time for the same amount of ITO removal. A small end radius of the cathode combines with enough electric power to drive fast machining. Pulsed direct current can improve the effect of dreg discharge, and it is advantageous to associate the workpiece with the fast feed rate. However, this improvement can increase the current rating. A high rotational speed of the electrodes, a higher temperature, or a large flow rate of the electrolyte corresponds to a higher removal rate for the ITO nanostructure. The micro electroremoval requires only a short period of time to remove the ITO thin film coatings easily and cleanly.