2004
DOI: 10.1007/978-1-4020-2111-4_32
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An Atomic Simulation of AFM-Based Nano Lithography Process for Nano Patterning

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Cited by 8 publications
(2 citation statements)
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“…The experiment shows that the hardness of silicon is 9.3 GPa [12] and of diamond is 78.96 GPa. [13] One can assume that diamond tip does not deform in the process of cutting the surface. After 5000-MD-step relaxation at temperature of 30 K, a stable structure of workpiece occurs.…”
Section: Pacs: 61 72 Hh 64 70 Kgmentioning
confidence: 99%
“…The experiment shows that the hardness of silicon is 9.3 GPa [12] and of diamond is 78.96 GPa. [13] One can assume that diamond tip does not deform in the process of cutting the surface. After 5000-MD-step relaxation at temperature of 30 K, a stable structure of workpiece occurs.…”
Section: Pacs: 61 72 Hh 64 70 Kgmentioning
confidence: 99%
“…[12,13] The time integration of motion is performed by the fifth Gear's predictor-corrector method, [14] time step š‘‘š‘” = 1.0 fs. The experiment shows that the Ni hardness is about 3.4 GPa and the hardness of diamond is 78.96 GPa; [15] one can assume that the diamond tip does not deform during the process of indentation.…”
mentioning
confidence: 92%