Abstract:A study was performed using a combination of in-situ real time ellipsometry and atomic force microscopy (AFM) to follow the RTCVD process in real time and measure key nucleation parameters in an effort to elucidate the mechanism of Si nucleation on SiO2. Real time ellipsometry data, in terms of delta versus time, showed significant changes as the deposition evolves from critical nuclei through coalescence to continuous film growth thereby allowing. process monitoring and control. From the AFM images, nuclei pa… Show more
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