2017
DOI: 10.1038/s41598-017-07021-1
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An atomic carbon source for high temperature molecular beam epitaxy of graphene

Abstract: We report the use of a novel atomic carbon source for the molecular beam epitaxy (MBE) of graphene layers on hBN flakes and on sapphire wafers at substrate growth temperatures of ~1400 °C. The source produces a flux of predominantly atomic carbon, which diffuses through the walls of a Joule-heated tantalum tube filled with graphite powder. We demonstrate deposition of carbon on sapphire with carbon deposition rates up to 12 nm/h. Atomic force microscopy measurements reveal the formation of hexagonal moiré patt… Show more

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Cited by 16 publications
(11 citation statements)
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“…It is expected that the choice of source and the corresponding operation conditions can impact the properties of the resulting MBE-grown graphene. 28 Finally, for the doped films, a similar trend is observed for samples prepared using growth approaches 1 and 2: a reduction in mobility when boron flux is increased, which is anticipated due to the creation of a higher number of scattering centers in the graphene lattice. However, differently from the charge carrier concentration, no clear distinction between the values obtained for samples prepared by approaches 1 and 2 can be seen.…”
Section: B)supporting
confidence: 55%
“…It is expected that the choice of source and the corresponding operation conditions can impact the properties of the resulting MBE-grown graphene. 28 Finally, for the doped films, a similar trend is observed for samples prepared using growth approaches 1 and 2: a reduction in mobility when boron flux is increased, which is anticipated due to the creation of a higher number of scattering centers in the graphene lattice. However, differently from the charge carrier concentration, no clear distinction between the values obtained for samples prepared by approaches 1 and 2 can be seen.…”
Section: B)supporting
confidence: 55%
“…The sticking probability of H-atoms with an incident energy of 300 K on a 10 K ASW ice is 0.4 21 , in comparison to the lower value of ∼0.02 for that of graphite 23 . Note that the carbon allotrope formed from the atomic source is determined to be amorphous 24 , and thus the sticking coefficient of H on our carbon surface is likely higher than ∼0.02.…”
Section: Resultsmentioning
confidence: 99%
“…of graphite 23 . Note that the carbon allotrope formed from the atomic source is determined to be amorphous 24 , and thus the sticking coefficient of H on our carbon surface is likely higher than ∼0.02.…”
Section: Resultsmentioning
confidence: 99%
“…32,33 The original design of the atomic carbon source is found in the work by Krasnokutski and Huisken, 34 and the source discussed in this article is a customized SUKO-A 40 from Dr. Eberl MBE-Komponenten GmbH (MBE), patent number DE 10 2014 009 755 A1. The design of the tantalum tube that is filled with graphite powder can be found in the works by Krasnokutski and Huisken 34 and Albar et al 35 Heating of the tube causes the carbon atom to sublimate and react with tantalum to produce tantalum carbide, resulting in the conversion of molecular carbon into atomic carbon. Thus, the advantage of this source is that it essentially produces C-atoms rather than Cx clusters (<1% C 2 and C 3 molecules).…”
Section: Introductionmentioning
confidence: 99%