“…Nevertheless, in the recent past, solution-phase deposition, simply termed as “solution processing”, has gained significant research interest due to its ease of fabrication under atmospheric pressure. − The challenging aspect of solution processing is the delivery of high-quality electronic-grade dielectric film. Spin coating of solution-phase precursors under thermal treatment yields porous mass due to evaporation of impurity ligands associated with the precursor, which are generally metal salts containing the required cation (e.g., for Al 2 O 3 , Al 3+ cations are sourced from Al(NO 3 ) 3 ). , The traditional approach to increase the densification in spin-coated thin films is a multilayered coating approach; however, it has challenges such as increased processing steps, time-consuming, and dissolution of the previously coated layer while depositing the subsequent layer. , To avoid this, many modifications in the solution processing are addressed in the literature, and one such method is spraying deposition. , The atomized droplets of liquid-phase precursors undergo thermal decomposition when coming in contact with the substrate and maintained at an elevated temperature. The large surface of atomized droplets facilitates the easy removal of impurity gases and promotes densification.…”