An aqueous‐base developable photoresist based on light‐induced cationic polymerization: Resist performance of poly(glycidyl methacrylate‐co‐methacrylic acid)

Abstract

SYNOPSISAn aqueous-base developable photoresist based on photoinduced cationic polymerization has been prepared by copolymerization of glycidyl methacrylate (GMA) and methacrylic acid (MAA) . The copolymer containing 83 mol % of GMA unit is soluble in an aqueous base and crosslinked in the presence of photogenerated acid caused by acid-initiated ringopening polymerization of pendant epoxide groups. Exposure results in the generation of acid and the subsequent baking process promotes the diffusion of photogenerated acid, which initiates the cationic crosslinking of the epoxide rings. It was also found that the sensitivity of the copolymer was remarkably enhanced when a divinyl ether monomer is added as a bifunctional crosslinker. The sensitivity enhancement may be caused by the high reactivity of the divinyl ether monomer in the presence of acid. The resist comprised of the copolymer, the vinyl ether monomer, and diphenyliodonium 9,lO-dimethoxy-anthracene-2-sulfonate as photoacid generator exhibited the sensitivity of 20 mJ/cm2. A good pattern profile with high resolution was attained by exposure to a 365 nm light followed by a postexposure bake at 6OoC for 3 min.

Fabrication of 3D high index photonic crystals by holographic lithography and their fidelity

“…We, therefore, sought to use an epoxy-based system with a controllable number of epoxy groups in an effort to optimize the tradeoffs between solubility of our resin for good film formation and number of epoxy groups required to switch solubility [34]. Glycidyl methacrylate (GMA) resins have previously been shown to form films with good mechanical properties and high chemical resistance, and have been employed for coatings, printing inks, recording materials, photoresists, and printing plates [35]. Our recent study shows that the 3D poly(glycidyl methacrylate) (PGMA) structures (Fig.…”

Influence of a Photo-Acid Generator on the Photoreactivity of a Photosensitive Polyimide Containing Epoxy Groups

“…[19][20][21][22] An absorption band at 1510cm-1 of the aromatic ring was chosen as an internal standard since its intensity is regarded as almost constant during crosslinking reactions. .s:, .…”

Composites of Reactive Silica Nanoparticles and Poly(glycidyl methacrylate) with Linear and Crosslinked Chains by in situ Bulk Polymerization

“…Due to the favorable processing conditions and transparency, silica particles have usually been associated with polyacrylates, particularly polymethylmethacrylate (PMMA) [12,14]. Polyglycidylmethacrylate (PGMA) has previously been shown to possess similar physical properties with PMMA, for example, film forming property, good mechanical properties, transparency, and high chemical resistance [15,16]. In fact, from the chemical point of view, PGMA has a significant advantage over PMMA because it has pendant oxirane rings, which can be opened and various functionalities can be introduced [17].…”