2013
DOI: 10.1260/1759-3093.4.1-2.17
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An approach to manufacture a heterobipolar transistors in thin film structures. On the method of optimization

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Cited by 44 publications
(59 citation statements)
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“…3a for diffusion doping of materials and Fig. 3b for ion doping of materials) [15][16][17][18][19][20]. Framework the criteria one shall approximate real distributions of concentration of dopant by ideal step-wise distribution ψ (x,y,z).…”
Section: Discussionmentioning
confidence: 99%
“…3a for diffusion doping of materials and Fig. 3b for ion doping of materials) [15][16][17][18][19][20]. Framework the criteria one shall approximate real distributions of concentration of dopant by ideal step-wise distribution ψ (x,y,z).…”
Section: Discussionmentioning
confidence: 99%
“…We calculate distribution of concentration of dopant in space in time by method of averaging of function corrections [25][26][27][28][29][30]. To use the method we re-write Eqs.…”
Section: Methods Of Solutionmentioning
confidence: 99%
“…To use the method we re-write Eqs. (1), (3) and (5) We determined average values of the first-order approximations of the considered concentrations by using the following standard relations [25][26][27][28][29][30] ( )…”
Section: Methods Of Solutionmentioning
confidence: 99%
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