2012
DOI: 10.1109/ted.2012.2217145
|View full text |Cite
|
Sign up to set email alerts
|

An Analytical Charge Model for Double-Gate Tunnel FETs

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
5

Citation Types

0
54
0

Year Published

2014
2014
2021
2021

Publication Types

Select...
5
4

Relationship

0
9

Authors

Journals

citations
Cited by 103 publications
(54 citation statements)
references
References 29 publications
0
54
0
Order By: Relevance
“…Quite a few compact analytic models for the TFET have been developed [4][5][6][7][8][9][10][11][12][13][14]. Refs.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Quite a few compact analytic models for the TFET have been developed [4][5][6][7][8][9][10][11][12][13][14]. Refs.…”
Section: Introductionmentioning
confidence: 99%
“…Refs. [4][5][6][7][8][9] employ a semianalytical solution of Poisson's equation in the channel region to model the channel charge [4] or to obtain the current-voltage characteristics [5][6][7][8][9]. These reports focus on particular TFET gate configurations, single-gate (SG) [5][6][7], double-gate (DG) [4,8,9,11], or gate-all-around [10], or on specific aspects of the transport, such as the output characteristic at small drain biases [12,13].…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, theoretical study and experimental illustration of TFETs with higher drive current without sacrificing I OFF are under intense investigation for low-power applications [4,5], which can be broadly classified into two types. The first type uses the modification of the structures of TFET such as use of double-gate (DG) architecture [6], thin silicon body [7], low-k spacer [8], heteromaterial gate [9], and gate-to-source/drain overlap/ underlap [10,11]. Alternative type concentrates on the proper selection of material systems required to design a high-performance TFET in order to extend the ITRS roadmap [12] by employing heterostructure silicon/intrinsic-SiGe channel [13,4,14,15], or Ge in the source region [16], a high-k gate dielectric [17], source/drain doping engineering [18,19], and use of graphene as a channel material [20] to improve the switching current ratio between the ON-state and the OFF-state (I ON /I OFF ratio).…”
Section: Introductionmentioning
confidence: 99%
“…[18] proposed analytically 2D non-linear Poisson's equation considering the inversion charge carrier for the reduction of tunneling barrier width with low gate and high gate voltage. In another paper [19,20], compact model has been derived for surface potential in DGTFET by splitting it into a gated tunnel diode and DGMOSFET based on charge model for circuit implication. The compact model is the mathematical model of active devices.…”
Section: Introductionmentioning
confidence: 99%