“…Therefore, theoretical study and experimental illustration of TFETs with higher drive current without sacrificing I OFF are under intense investigation for low-power applications [4,5], which can be broadly classified into two types. The first type uses the modification of the structures of TFET such as use of double-gate (DG) architecture [6], thin silicon body [7], low-k spacer [8], heteromaterial gate [9], and gate-to-source/drain overlap/ underlap [10,11]. Alternative type concentrates on the proper selection of material systems required to design a high-performance TFET in order to extend the ITRS roadmap [12] by employing heterostructure silicon/intrinsic-SiGe channel [13,4,14,15], or Ge in the source region [16], a high-k gate dielectric [17], source/drain doping engineering [18,19], and use of graphene as a channel material [20] to improve the switching current ratio between the ON-state and the OFF-state (I ON /I OFF ratio).…”