2017
DOI: 10.1109/lmwc.2017.2750086
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An Active Interferometric Method for Extreme Impedance On-Wafer Device Measurements

Abstract: Nano-scale devices and high power transistors\ud present extreme impedances, which are far removed from the\ud 50-Ω reference impedance of conventional test equipment,\ud resulting in a reduction in the measurement sensitivity as\ud compared with impedances close to the reference impedance. This\ud letter describes a novel method based on active interferometry\ud to increase the measurement sensitivity of a VNA for measuring\ud such extreme impedances, using only a single coupler. The\ud theory of the method i… Show more

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Cited by 7 publications
(9 citation statements)
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References 9 publications
(7 reference statements)
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“…This can be either an IQ-steering technique [15] shown in Fig. 4(b) or a second, phase coherent, source [16] as shown in Fig. 4(c).…”
Section: B Active Methodsmentioning
confidence: 99%
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“…This can be either an IQ-steering technique [15] shown in Fig. 4(b) or a second, phase coherent, source [16] as shown in Fig. 4(c).…”
Section: B Active Methodsmentioning
confidence: 99%
“…The analysis of the Section II clearly demonstrates, through the noise analysis of (1), that the zero-reflected wave condition provides the smallest noise in S-parameter measurements of a generic DUT. To reach this wave condition, several RF interferometric techniques have been developed [13]- [16] all aiming at cancelling the scattered b dut -wave generated by the (high | dut |) DUT through the injection of an additional, compensating the b int -wave signal. Fig.…”
Section: Comparison Of Interferometric Techniquesmentioning
confidence: 99%
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“…In 2015, an I/Q-mixer-based interferometric technique is developed for speed operation and noise reduction [19]. In 2017, an active interferometric method using the internal sources of a multiport VNA and an external coupler is introduced [20]. These studies have proven that RF interferometric techniques are candidates to tackle the problem of impedance mismatch in a variety of applications.…”
Section: Brief State Of the Artmentioning
confidence: 99%