1984
DOI: 10.1088/0022-3727/17/8/014
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An accurate determination of the radial distribution of gain at 633 nm in small bore helium-neon discharges

Abstract: A sensitive technique for the determination of optical gain in a DC discharge is outlined. This technique has permitted an investigation of the radial distribution of optical gain at 633 nm in a 3 mm bore discharge with a spatial resolution of around 120 mu m. Results are presented which illustrate the behaviour of this distribution with gas pressure and current.

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Cited by 6 publications
(10 citation statements)
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“…We chose to investigate four different pressure of gas mixture and, for each pressure, three different power level of plasma discharge. Following the literature [14], we have chosen for each He-Ne mixture, a pressure of 0.22 mbar of Ne and then we have added He up to 1.33, 2.66, 5.00, 10.00 mbar. Before the first filling the cavity has been baked and pumped down to 10 −6 mbar, and before each refill we have restored the vacuum condition to clean the system.…”
Section: Measurement Techniquementioning
confidence: 99%
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“…We chose to investigate four different pressure of gas mixture and, for each pressure, three different power level of plasma discharge. Following the literature [14], we have chosen for each He-Ne mixture, a pressure of 0.22 mbar of Ne and then we have added He up to 1.33, 2.66, 5.00, 10.00 mbar. Before the first filling the cavity has been baked and pumped down to 10 −6 mbar, and before each refill we have restored the vacuum condition to clean the system.…”
Section: Measurement Techniquementioning
confidence: 99%
“…Before the first filling the cavity has been baked and pumped down to 10 −6 mbar, and before each refill we have restored the vacuum condition to clean the system. Considering the size of the tube and the laser waist dimension, we chose to move the probe laser along the diameter of the plasma discharge by steps of 0.25 mm using the micrometric screws shown in Fig 1 . The difficulties of this type of study are mainly two: the handling of a RF source, and the fact that the expected gain of this kind of system is of the order of only some hundreds of ppm [12,13,14,16]. About the first issue, differently from a DC plasma discharge the power supplied by a RF source needs an initial high-voltage discharge to switch on the plasma.…”
Section: Measurement Techniquementioning
confidence: 99%
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