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2017 Conference on Lasers and Electro-Optics Europe &Amp; European Quantum Electronics Conference (CLEO/Europe-EQEC) 2017
DOI: 10.1109/cleoe-eqec.2017.8086259
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Amplification of DUV solid-state laser pulse using ArF laser

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Cited by 3 publications
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“…Narrow band light sources in the deep ultraviolet (DUV) and vacuum ultraviolet (VUV) regions are attractive for photolithography 1) and photoelectron spectroscopy. 2,3) For photolithography, hybrid ArF lasers consisting of a solid state oscillator stage and an ArF amplifier have been developed, achieving an average power of 120 W. 4) Nonlinear crystals, such as KBe 2 BO 3 F 2 (KBBF) 1,5,6) and CsLiB 6 O 10 (CLBO), [7][8][9] were used to generate 193 nm seeds at the oscillator stage. The pulse durations are in the range of 4-5 ns.…”
Section: Introductionmentioning
confidence: 99%
“…Narrow band light sources in the deep ultraviolet (DUV) and vacuum ultraviolet (VUV) regions are attractive for photolithography 1) and photoelectron spectroscopy. 2,3) For photolithography, hybrid ArF lasers consisting of a solid state oscillator stage and an ArF amplifier have been developed, achieving an average power of 120 W. 4) Nonlinear crystals, such as KBe 2 BO 3 F 2 (KBBF) 1,5,6) and CsLiB 6 O 10 (CLBO), [7][8][9] were used to generate 193 nm seeds at the oscillator stage. The pulse durations are in the range of 4-5 ns.…”
Section: Introductionmentioning
confidence: 99%