Amorphous Si1−xCx:H films prepared by hot-wire CVD using SiH3CH3 and SiH4 mixture gas and its application to window layer for silicon thin film solar cells

a‐SiC:H Films by Remote Hydrogen Microwave Plasma CVD From Ethylsilane Precursors**

“…a‐SiC:H films attract great interest due to their many unique properties, such as mechanical, tribological, electrical, optical, and optoelectronic, as well as having strong thermal and chemical resistance . They are very promising coatings for a wide range of technological applications.…”

“…They are very promising coatings for a wide range of technological applications. According to recent reports they may be used, for example, as scratch‐ and corrosion‐resistant protective coatings, optical waveguides for telecommunications, window or emitter p‐layers in solar cells, and microwave‐absorbing coatings for microwave heating systems …”

Nanocrystalline thin film silicon solar cells: A deeper look into p/i interface formation

“…It was reported that the insertion of a wide bandgap semiconductor layer, such as a-SiC:H, contributed to improve the blue response [14] and efficiency of a-Si:H solar cells [15], [16]. Other groups used protocrystalline silicon (pc-Si:H) [17], [18] or boron-doped microcrystalline silicon (p-μc-Si:H) [19] as buffer layers instead of a-SiC:H. Bugnon et al explored SiO x as buffer layer in microcrystalline (μc-Si:H) and amorphous (a-Si:H) solar cells [20], finding that a SiO x A C C E P T E D M A N U S C R I P T…”

Amorphous Hydrogenated Silicon Carbide (a‐SiC:H) Coatings Produced by Remote Hydrogen Microwave Plasma CVD from Bis(dimethylsilyl)ethane ‐ a Novel Single‐Source Precursor

“…Owing to their many unique properties, such as mechanical, [1][2][3][4][5] tribological, [3,5] electrical, [6,7] optical, [8,9] and optoelectronic, [9] as well as high thermal and chemical stability, [3] a-SiC:H coatings are important thin-film materials which meet the requirements of advanced technology. According to recent reports they may be used as e.g., scratch-and corrosion-resistant protective coatings, [3] optical waveguides for telecommunication, [8] and window or emitter p-layers in solar cells.…”

“…According to recent reports they may be used as e.g., scratch-and corrosion-resistant protective coatings, [3] optical waveguides for telecommunication, [8] and window or emitter p-layers in solar cells. [6,9] The a-SiC:H coatings are fabricated by various CVD methods among which the remote hydrogen microwave plasma (RP-CVD) was found to be a very beneficial technique for the formation of defectfree and highly uniform films. The present communication deals with the formation of aSiC:H films by RP-CVD using hydrogen for microwave plasma generation and bis(dimethylsilyl)ethane (BDMSE), (Me 2 HSiCH 2 ) 2 as a novel precursor.…”