Abstract:To accomplish minimizing feature size to sub 7Onm, 157nm photolithography becomes a strong candidate as a new lithographic technology. However, there is a strong need for new photoresists, which are transparent to 157nm light sources. To have a transparency for 157nm light source, fluorinated organic polymers are studied intensively. As a result, there are some ofpolymers that have absorbance of 2//tm. However, in spite ofthis low absorbance of 2//tm, resist profile simulation tells us bulk slope problems. To … Show more
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