Aluminum transfer buildup on PVD coated work rolls during thermomechanical processing

Li, B.; Gali, O.A.; Shafiei, M.; Hunter, John; Riahi, A.R.

doi:10.1016/j.surfcoat.2016.07.091

Cited by 5 publications

(5 citation statements)

References 19 publications

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“…With elongating the pulse width or decreasing deposition pressure, the tetrahedron-top columns widen along the three ridges and become tangled 3-point star top columns. This phenomenon is also found in other reported HiPIMS Cr films deposited at modulate peak power [5,18]. In HiPIMS processes, both the numbers of ions and the portion of high energy ions increase with peak power [16], which enables a higher mobility of adatom to diffuse further [11,26].…”

Section: Effects Of the Deposition Pressure And The Hipims Pulse Widt...supporting

confidence: 83%

“…Much effort has been invested over the decades to develop alternatives to replace the toxic chrome electroplating process. Environmentally-safe physical vapor depositions (PVD) can provide a simple yet reliable chromium coating [2][3][4][5]. In addition to being the protective and decorative top-coat layer, chromium layers can also be used as the adhesion enhancement interlayer for nitride and carbide coatings [6,7].…”

Section: Introductionmentioning

confidence: 99%

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Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films

Kuo

Lin

Lin³

et al. 2020

Coatings

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Environmentally-safe high-power impulse magnetron sputtering (HiPIMS) technology was utilized to deposit chromium films. This research focused on the influences of the HiPIMS pulse widths on the microstructure of films deposited at different deposition pressures and substrate bias voltages. Under the conditions of the same average HiPIMS power and duty cycle, the deposition rate of the Cr thin film at working pressure 0.8 Pa is slightly higher than at 1.2 Pa. Also, the difference between deposition rates under two pressures decreases with the discharge pulse width. The deposition rate of the short pulse width 60 μs is lowest, but those of 200 and 360 μs are approximately the same. With no or small direct current substrate biasing, the microstructure of films coated at short pulse width is similar to the typical magnetron sputtering deposited films. Elongating the pulse width enhances the ion flux toward the substrate and changes the film structure from individual prism-like columns into tangled 3-point/4-point star columns. Substantial synchronized substrate biasing and longer pulse width changes the preferred orientation of Cr films from Cr (110) to Cr (200) and Cr (211). The films deposited at longer pulse width exhibit a higher hardness due to the reducing of intercolumn voids.

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Section: Effects Of the Deposition Pressure And The Hipims Pulse Widt...supporting

confidence: 83%

Section: Introductionmentioning

confidence: 99%

Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films

Kuo

Lin

Lin³

et al. 2020

Coatings

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“…Among them, great achievements are particularly needed in the energy sector which will allow us to maintain our growing appetite for energy. An example for thin-film technology is displayed in figure 2 [9]. For the case of fossil fuel effect, it is displayed in figure 3 to show the ill effects of fossil fuels for infrastructure through toxic emissions into the atmosphere.…”

Section: Combine Nanotechnology and Radioactive Waste To Generate Ele...mentioning

confidence: 99%

“…Figure 2. Production of tools and molds for machining,anticorrosive materials, materials for functional and decorative coatings[9].…”

mentioning

confidence: 99%

Modern Nanotechnology Application for Generation Highly Efficient Electricity in Save Mode and Much Less Polluting

HASAN

Danışmaz

WAHEED

2022

International Journal of Computational and Experimental Science and Engineering

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Most world country dependent on foreign oil to make things working, which means political disputes or any disputes between countries can result in energy crunches. The negative changes that occur in the global climate and environment due to the burning of fossil fuels, stimulate the search for modern and environmentally friendly sources of energy production. In addition, continued concern about the storage and processing of nuclear waste may limit nuclear energy options. New concepts use nanotechnology as a new application for production of the electricity. In the modern thin-film application technologies, a number of layers can be deposited to improve the cells' energy density, reduce operating temperatures, and lower manufacturing costs. Solid oxide fuel cells (SOFCs), which have the ability to convert chemical energy into electrical energy without combustion, are among the advantages of this cell; High efficiency and much less pollution. Fuel cells -zinc, air, proton exchange membranes, and solid oxide are recent and established energy applications. Several of these solid oxide fuel cells (SOFCs) have emerged as fuel cell technology that has additional positive advantages.

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“…In industrial applications, coatings are used to protect components against wear or corrosion in aggressive environments. PVD Cr and Cr-based coatings have been shown to exhibit high sliding wear resistance in many applications [7,14,15]. For most metals, PVD coatings thicker than 3-5 µm can be problematic due to high internal stresses; however, this has been observed not to be the case for PVD Cr and Cr-based coatings which can be deposited with thicknesses up to 20 µm [7].…”

Section: Introductionmentioning

confidence: 99%

A comparison of the galling wear behaviour of PVD Cr and electroplated hard Cr thin films

Daure

Carrington

Shipway

et al. 2018

Surface and Coatings Technology

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Electroplated hard chromium (EPHC) is used in many industries as a wear and corrosion resistant coating. However, the long term viability of the electroplating process is at risk due to legislation regarding the toxic chemicals used. The physical vapour deposition (PVD) process has been shown to produce chromium and chromium-based coatings that could be a possible alternative for EPHC in some applications. This study investigates the microstructure and properties of two PVD chromium coatings as a possible alternative to EPHC to provide resistance to galling. Two PVD deposition processes are investigated, namely electron beam PVD (EBPVD) and unbalanced magnetron sputtering (UMS). Galling wear tests were performed according to ASTM G98-17. The results show that the two PVD coatings are of similar hardness, surface roughness and exhibit similar scratch behaviour. However, the galling wear resistance of the coating deposited by UMS is approximately ten times that of the EBPVD coating, and similar to that of the EPHC. X-ray diffraction reveals that the EBPVD chromium coating has a strong preferred orientation of the {2 0 0} planes parallel to the coating surface whilst in the UMS PVD coating, preferred orientations of the {1 1 0} and {2 1 1} planes parallel to the surface are observed. The EPHC does not exhibit relative peak intensities which conform to the International Centre for Diffraction Data (ICDD) powder diffraction pattern consistent with chromium. The crystal orientation of the PVD chromium coatings appears to play a significant role in influencing galling resistance.

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Aluminum transfer buildup on PVD coated work rolls during thermomechanical processing

Cited by 5 publications

References 19 publications

Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films

Effects of Cathode Voltage Pulse Width in High Power Impulse Magnetron Sputtering on the Deposited Chromium Thin Films

Modern Nanotechnology Application for Generation Highly Efficient Electricity in Save Mode and Much Less Polluting

A comparison of the galling wear behaviour of PVD Cr and electroplated hard Cr thin films

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