2010
DOI: 10.1007/s11664-010-1455-2
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Aluminum Gallium Nitride Alloys Grown via Metalorganic Vapor-Phase Epitaxy Using a Digital Growth Technique

Abstract: This work investigates the use of a digital growth technique as a viable method for achieving high-quality aluminum gallium nitride (Al x Ga 1Àx N) films via metalorganic vapor-phase epitaxy. Digital alloys are superlattice structures with period thicknesses of a few monolayers. Alloys with an AlN mole fraction ranging from 0.1 to 0.9 were grown by adjusting the thickness of the AlN layer in the superlattice. High-resolution x-ray diffraction was used to determine the superlattice period and c-lattice paramete… Show more

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Cited by 9 publications
(11 citation statements)
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“…The switched atomic layer epitaxy yields a sharp absorption edge and clear interfaces 58 . Following works on this issue further revealed that high-quality GaN/AlN short-period SLs possess properties that are significantly different from traditional continuous AlGaN epilayer 59 62 . In 2011, Rodaka et al worked on AlN/GaN SLs and explored the relationship of the binary alloy growth rates with the interfacial quality 63 .…”
Section: Manipulation Of Fields Of Chemical Potentialsmentioning
confidence: 99%
“…The switched atomic layer epitaxy yields a sharp absorption edge and clear interfaces 58 . Following works on this issue further revealed that high-quality GaN/AlN short-period SLs possess properties that are significantly different from traditional continuous AlGaN epilayer 59 62 . In 2011, Rodaka et al worked on AlN/GaN SLs and explored the relationship of the binary alloy growth rates with the interfacial quality 63 .…”
Section: Manipulation Of Fields Of Chemical Potentialsmentioning
confidence: 99%
“…The fabrication starts with the growth of layers that make up the LED active regions using MOVPE techniques [38], [39]. The LED structure is grown on a sapphire substrate (430 μm thick) and is shown in the Fig.…”
Section: Device Fabricationmentioning
confidence: 99%
“…1. [39], [38]. InGaN/GaN -based quantum wells with a periodicity of 11.90 nm (QW ∼ 4 nm, Barrier ∼ 8 nm) were grown with 16% indium concentration (In 0.16 Ga 0.94 N) on n-type (Silicon doped) GaN and followed by p-type (Magnesium doped) GaN.…”
Section: Device Fabricationmentioning
confidence: 99%
“…This process takes place in a rapid thermal annealer (RTA) at 800 ˚C for 5 minutes in a nitrogen environment of 500 sccm. This is done to activate the charge carriers and reduce the defects of the p-type GaN [181].…”
Section: Discussionmentioning
confidence: 99%