Aluminum films prepared by metal-organic low pressure chemical vapor deposition

Green, M. L.; Lévy, R.; Nuzzo, Ralph G.; Coleman, E.

doi:10.1016/0040-6090(84)90136-6

Cited by 88 publications

(35 citation statements)

References 5 publications

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“…The electrical resistivity of Al coatings deposited at 573 K with a similar injection rate was measured to be 3.5 AE 0.1 mVÁcm, a value greater than that of bulk Al (2.7 mVÁcm) but in agreement with other reported values for Al thin films. [20] The difference in values is attributed to the inherent loss in precision associated with measurements of a rough surface topography, [21] and the presence of oxygen in the coatings as noted in the aforementioned GD-OES results. It is generally recognized that the CVD process offers excellent thickness distribution on substrates with complex geometries.…”

Section: à3mentioning

confidence: 95%

Investigation of Atmospheric Pressure CVD‐Produced Aluminum Coatings for the Protection of Steel from Corrosion

Maeng

Suh

et al. 2010

Chemical Vapor Deposition

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This study investigates the use of atmospheric pressure (AP)CVD-produced aluminum (Al) coatings for the protection of steel from corrosion. Coatings produced through thermal decomposition of a triisobutylaluminum (TIBAL)-based precursor at 548 and 573 K are shown to exhibit growth rates of 0.5 and 1.1 mm min À1 , respectively. Glow discharge optical emission spectroscopy (GDOES) reveals that, in the main, the coatings consist of pure Al with oxygen present as a minor constituent. Results of the structural, morphological, electrical, and mechanical characterization reveal that the APCVD Al coatings exhibit a face center cubic (fcc) structure with no preferred orientation, a non-columnar grain structure with grain size ranging from 3 to 10 mm, and a surface roughness close to 2 mm. Such coatings are also shown to offer an electrical resistivity of 3.5 mVÁcm, a density of 2.60 g cm À3, and an adhesive strength of 703 kg cm À2 . Cross-sectional examination of coated samples indicate that the APCVD process can yield excellent step coverage and throwing power. Hydrogen embrittlement (HE) tests reveal that Al-coated bars with no post baking experience premature failure due to the presence of incorporated reaction product, hydrogen, in the steel substrate. Samples post-baked at 463 K for 23 h to remove the hydrogen from the substrate are shown to withstand the load for as long as 202 h. Corrosion studies conducted using potentiodynamic polarization measurements, electrochemical impedance spectroscopy, and salt fog tests show that the corrosion resistance of the APCVD Al coatings is comparable to that of pure Al foils, and that such coatings provide acceptable sacrificial protection for steel substrates.

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Section: à3mentioning

confidence: 95%

Investigation of Atmospheric Pressure CVD‐Produced Aluminum Coatings for the Protection of Steel from Corrosion

Maeng

Suh

et al. 2010

Chemical Vapor Deposition

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“…Unlike the analogous gallium source, the thermal pyrolysis of (CH 3 ) 3 Al leads to the formation of Al 2 C 3 and not Al metal [85][86][87]. Triethyl aluminum, (C 2 H 5 ) 3 Al, and triisobutyl aluminum, ((CH 3 ) 2 CHCH 2 ) 3 Al, decompose through a b-elimination reaction [88] and can lead to the deposition of metallic Al [89]. Triethyl aluminum, (C 2 H 5 ) 3 Al, and triisobutyl aluminum, ((CH 3 ) 2 CHCH 2 ) 3 Al, decompose through a b-elimination reaction [88] and can lead to the deposition of metallic Al [89].…”

Section: Aluminum Sourcesmentioning

confidence: 99%

Metal Organic Vapor Phase Epitaxy Chemical Kinetics

Kuech

2015

Handbook of Crystal Growth

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“…Individual 4 values for TMA and DMAH were obtained, based on the observed optical density for the C-H stretching band and the concentration calculated from its vapor pressure (TMA: 11.6 Torr; 9 DMAH: 1.9 Torr 8 ), assuming the ideal gas laws. Molar concentration C for TDMA can be estimated using Eqn [2]. The TDMA molar fraction in the DMAH (70 mol% as a monomer) TMA (30 mol% as a monomer) vapor mixture was estimated to be at least 50 mol%.…”

Section: Evaluation Of the Tdma Fraction In The Mixturementioning

confidence: 99%

“…Then how many TDMA molecules are there in the TMA and DMAH mixture? Following the BeerLambert law, the TDMA molar concentration C is represented by Eqn [2], CL 2…”

Section: Evaluation Of the Tdma Fraction In The Mixturementioning

confidence: 99%

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New molecular compound precursor for aluminum chemical vapor deposition

Shinzawa

Uesugi

Nishiyama

et al. 2000

Appl. Organometal. Chem.

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A new type of precursor for aluminum chemical vapor deposition (Al‐CVD) has been developed by mixing dimethylaluminum hydride (DMAH) and trimethylaluminum (TMA). The new precursor has proven itself to be effective for Al‐CVD, where a good selectivity between the Si and the SiO2 mask, a 3.0 μΩ cm resistivity and a pure Al film with low C and O contamination levels (under 100 ppm) were achieved. Quadrupole mass and infrared absorption analysis have shown that the precursor contains a new molecular compound, consisting of a DMAH monomer and a TMA monomer. The mixture has lower viscosity than DMAH and can be easily bubbled for a stable precursor vapor supply. Copyright © 2000 John Wiley & Sons, Ltd.

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Aluminum films prepared by metal-organic low pressure chemical vapor deposition

Cited by 88 publications

References 5 publications

Investigation of Atmospheric Pressure CVD‐Produced Aluminum Coatings for the Protection of Steel from Corrosion

Investigation of Atmospheric Pressure CVD‐Produced Aluminum Coatings for the Protection of Steel from Corrosion

Metal Organic Vapor Phase Epitaxy Chemical Kinetics

New molecular compound precursor for aluminum chemical vapor deposition

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