2022
DOI: 10.1063/5.0101686
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Aluminum-ferromagnetic Josephson tunnel junctions for high quality magnetic switching devices

Abstract: The competition between superconducting and ferromagnetic orderings in Josephson devices has promoted fundamental and applicative studies of high impact for superconducting digital technology, cryogenic memories, and spintronics, where the possibility of switching between different magnetic states is a crucial advantage. Here, we report on fabrication and characterization of very high quality tunnel ferromagnetic Josephson junctions (JJs) with aluminum electrodes, demonstrating hysteretic behavior of the magne… Show more

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Cited by 11 publications
(3 citation statements)
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“…Furthermore, our process allows the deposition of additional layers, and specifically of the ferromagnetic (F) layer afterward the definition of the junction. The overall structure is a magnetic JJ (MJJ) of the type SIS’FS; i.e., a superconductor/insulator/thin superconductor/ferromagnet/superconductor stacked multilayer [ 19 ]. So far, tunnel SIS’FS JJs have been designed using standard Nb technology for the implementation of cryogenic superconducting magnetic memories compatible with single-flux-quantum (SFQ) circuitry.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Furthermore, our process allows the deposition of additional layers, and specifically of the ferromagnetic (F) layer afterward the definition of the junction. The overall structure is a magnetic JJ (MJJ) of the type SIS’FS; i.e., a superconductor/insulator/thin superconductor/ferromagnet/superconductor stacked multilayer [ 19 ]. So far, tunnel SIS’FS JJs have been designed using standard Nb technology for the implementation of cryogenic superconducting magnetic memories compatible with single-flux-quantum (SFQ) circuitry.…”
Section: Introductionmentioning
confidence: 99%
“…The magnetic nature of the SIS’FS junction guaranteed by the F layer is confirmed by the hysteretic behavior of the magnetic field pattern, while preserving the high quality of the tunnel behavior guaranteed by the Al oxide barrier. This technology can be extended to most ferromagnetic materials to develop ad hoc switchable elements, and guarantee the easy integration of MJJs in a large variety of digital and quantum circuits by standard optical lithography [ 19 ]. In addition, the developed fabrication approach is reproducible and adaptable to a wide class of fabrication protocols since ferromagnetic materials can be deposited ex situ without affecting the tunnel properties of the overall device.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, graphene processability also represents a limiting factor in its full exploitation in device development. Advancements towards next-generation electronics and sensing technology [19,20] have been achieved through fabrication techniques at the nanoscale, such as electronic lithography, gentle etching, nanopatterning [21], material deposition [22][23][24], and interlayer positioning [25]. In particular, this last technique has been investigated for the achievement of high transparent contact on graphene flakes [25][26][27], proving to be useful in facilitating the current passage [20,[28][29][30][31][32].…”
Section: Introductionmentioning
confidence: 99%