AlTiTaZr(-N) Medium-Entropy Films Deposited by Magnetron Sputtering with a Combinatorial Approach

Refractory high-entropy films (RHEFs) are a new type of high-temperature material with great prospects for applications due to their superior properties. They have the potential to replace nickel-based superalloys in order to develop a new generation of materials that can be used under extreme conditions. (TiTaZrHf)100−xYx RHEFs are prepared using the magnetron sputtering technique. The yttrium (Y) content varies from 0 to 56 at.%. XRD analysis indicates the formation of an amorphous phase in Y-free films, while new phases are formed after the addition of Y. The results are confirmed by TEM analysis, revealing the formation of nano-grains with two phases L12 and Y-P6/mmm structure. With an increasing Y content, the grain size of the nano-grains increases, which has a significant effect on the mechanical properties of the films. Hardness decreases from 9.7 GPa to 5 GPa when the Y amount increases. A similar trend is observed for the Young’s modulus, ranging from 111.6 to 82 GPa. A smooth and featureless morphology is observed on the low Y content films, while those with a larger Y content appear columnar near the substrate. Furthermore, the phase evolution is evaluated by calculating the thermodynamic criteria ΔHmix, ΔSmix, Ω, and δ. The calculation results predict the formation of new phases and are then in good agreement with the experimental characterization.

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AlTiTaZr(-N) Medium-Entropy Films Deposited by Magnetron Sputtering with a Combinatorial Approach

Cited by 3 publications

References 43 publications

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Effect of Annealing on Microstructural and Tribological Properties of CoCrFeNiW0.3 + 5 at.% C High Entropy Alloy

Nano-mechanical properties of Cr-Zr-Nb-N medium entropy alloy films produced by reactive sputtering

The Effect of Yttrium Addition on Microstructure and Mechanical Properties of Refractory TiTaZrHfW High-Entropy Films

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