2012
DOI: 10.1117/12.916497
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Alternative smoothing techniques to mitigate EUV substrate defectivity

Abstract: The majority of extreme ultraviolet (EUV) lithography mask blank defects originate from chemical mechanical polishing (CMP) of the substrate. The fact that CMP has not yet been able to yield EUV substrates with low defect counts highlights the challenges of polishing doped fused silica surfaces. Here we investigate alternative techniques based on processing either the substrate or coatings of amorphous silicon thin films and inorganic metal oxides. In particular, we evaluate a novel polymer-based non-abrasive … Show more

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Cited by 9 publications
(5 citation statements)
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“…Since DPs are always created at the tips of the bump on the material surface under light irradiation, the present autonomous etching has been applied to smoothing of a variety of surfaces and materials: the side surface of a diffraction grating [30], the surface of a photomask used for conventional ultraviolet lithography [31], and the surfaces of GaN crystals [32], transparent ceramics [33], and diamonds [34].…”
Section: Technology That Uses Neither Fiber Nor Aperturementioning
confidence: 99%
“…Since DPs are always created at the tips of the bump on the material surface under light irradiation, the present autonomous etching has been applied to smoothing of a variety of surfaces and materials: the side surface of a diffraction grating [30], the surface of a photomask used for conventional ultraviolet lithography [31], and the surfaces of GaN crystals [32], transparent ceramics [33], and diamonds [34].…”
Section: Technology That Uses Neither Fiber Nor Aperturementioning
confidence: 99%
“…These included a convex surface, a concave surface, and the inner surface of a cylinder. As an example, this etching has smoothed the side surface of a diffraction grating composed of parallel linear corrugated patterns 64 and the surface of a photo-mask used for conventional ultraviolet lithography 65 . Furthermore, a variety of materials have been smoothened, such as the surfaces of GaN crystals 66 , transparent ceramics 67 , and diamonds 68 .…”
Section: Nano-fabrication Technologymentioning
confidence: 99%
“…Some improvements using fine polishing have been made to minimize the quartz glass defects, [5][6][7] and other extraordinary processes based on new concepts are being investigated. [8][9][10] Recently, nanoimprinting technology has been attracting considerable attention as one of the most useful fabrication techniques for simple and low-cost surface nanopatterning and smoothing of glassy materials. [11][12][13][14] For example, a surface smoothing method using a thermal nanoimprinting technology with an atomically stepped sapphire mold (α-Al 2 O 3 single crystal) with atomically flat surfaces having 0.2-nm-high atomic steps formed via atom migration has been investigated for reducing the surface energy during thermal annealing.…”
mentioning
confidence: 99%