Alternating PSM balancing characterization: a comparative study using AIMS and wafer print data

How to match without copying: an approach for APSM mask process matching using aerial imaging

“…[5]). This means: for a selection of design situations the through-focus CD of neighboring zero-and pi-phase features was compared.…”

“…In sum this results in a huge amount of work and time required. An alternative approach is to not copy the mask but to match its imaging properties [5]. In this paper it is described how this can be done successfully: In a first step a customer-provided testmask was characterized using AIMS TM measurements.…”