Alpha particle spectrometry based on the mean grey level and visibility of track etch-pit in CR-39 Nuclear Track Detector

Abstract

The CR-39 detector is used in this work to present an exceptional technique for alpha-particle spectrometry. This new approach is based on determining the mean grey level and visibility of the alpha particle track etch-pit. The latter is used to discriminate alpha particles of different energies that produce the same track diameter at the same etching time. CR-39 detectors had been irradiated by alpha particles with energies 1, 2, 3, 4, and 5 MeV thereafter are chemically etched in 6.25 M NaOH at 70 °C. At various etching periods, the diameter, the mean grey level, and the visibility of the alpha particle track etch-pit were measured. The findings reveal that for a given alpha particle, the mean grey level rises with the increase of the etching time. Conversely, both the visibility and contrast of alpha particle tracks are deteriorating. The alpha particle track etch-pit of equal diameters results from an alpha particle of different energies having different mean grey levels and visibility. In addition, it is confirmed that the mean grey level and visibility of the alpha particle etch-pit are shown to be correlated with the alpha particle energy at a particular etching time. Finally, the proposed approach is intended to overcome the non-monotonical relationship of diameter to the energy of alpha particle track etch-pit. So, our findings have the potential to broaden the application of CR-39 as an alpha particle spectrometer.

Low energy alpha particles dose mapping with a combination of CR-39 detector and a high resolution flatbed scanner

“…For higher alpha particles doses (higher track density), where the etch pits overlap as the etching time (removal thickness) progresses, such as 0.033 Gy, 0.051 Gy, 0.067 Gy, 0.134 Gy, and 0.164 Gy, the optical density increases with the etching time up to a maximum value, which depends on 4 MeV alpha particles dose, then decreases for longer etching times. As the dose increases, the alpha etch pits overlap and the surface roughness diminishes; as a result, light scattering and optical density decrease [28,29]. The peak of optical density shifts constantly towards shorter etching times.…”