Allyl(β-diketonato)palladium(II) Complexes, Including Liquid Precursors, for Chemical Vapor Deposition of Palladium

Abstract

The synthesis, characterization, and application as chemical vapor deposition (CVD) precursors of several new complexes of the type η3-allyl(β-diketonato)palladium(II) are reported. Some of these include the first liquid precursors for CVD of thin films of pure palladium. The CVD can be conducted at 170−315 °C, and the purest films are obtained using oxygen as the carrier gas, either at atmospheric pressure or under partial vacuum. Some observations with respect to the mechanism of the CVD process are also described.

Deposition of Palladium from a Cylcopentadienyl‐allyl‐palladium Precursor on Si‐Based Substrates with Various Pretreatments: The Role of Surface Si–OH and Si‐H Species Studied by X‐Ray Photoelectron Spectroscopy

“…In the final step, the temperature was increased to room temperature and the sample was again analyzed by XPS at 300 K. SEM measurements were carried out using a LEO 1530 Gemini microscope. The CpPd(allyl) precursor was prepared and cleaned according to the prescription reported in the literature [34][35][36], and subsequently stored in a UHV glass vessel mounted on the preparation chamber. Using a cryostat the temperature of the glass tube containing the precursor was kept below ±18 C in between the different measurements.…”

Single-atom active sites on metal-organic frameworks

“…This novel methodology, called vapour phase PSM (VP-PSM), is a general, efficient and versatile route that overcomes the limitation of standard PSM methods. The concept of VP-PSM is based on that of chemical vapour deposition (CVD; Zhang et al 1998;Serp et al 2002). Organic substances, instead of volatile metal complexes, such as in CVD, are diffused through the pores of the MOFs in static vacuum and moderate temperature to create organic covalent bonds.…”

Highly Ordered Macroporous Gold Film Formed by CVD Using Monodisperse Polystyrene Spheres as Templates

“…The precursor molecules 1, and 2, were prepared as described previously [18,28]. Polystyrene latex spheres (diameter 500 nm, from a 2.5 wt % dispersion in water, from Alfa Aesar) were assembled on an aluminum disk (ca.…”

“…In this method, either seeding the substrate surface or carrying out co-deposition with a catalytically active metal, usually using a reactive carrier gas such as hydrogen or oxygen, can greatly lower the CVD temperature. [19][20][21][22][23][24][25][26][27] In particular CECVD, with a palladium precursor as the catalyst, is known to reduce the deposition temperatures of CVD.[28] The polystyrene film was primed by transferring catalytic amounts of the 2-methylallylpalladium complex precursor [Pd(g 3 -CH 2 -CMeCH 2 )(fod)], [28] 2, fod = t BuCOCHCOC 3 F 7 , onto the polystyrene surface via sublimation, followed by decomposition of the precursor to palladium metal with a hydrogen carrier gas. In the presence of the pre-deposited palladium catalyst, gold deposition on the polystyrene film was possible, using the above CVD procedure, over the temperature range 65-85°C.…”