All Solid State Color Camera With Single-Chip Mos Imager

Nabeyama, Hiroaki; Nagahara, Shusaku; Shimizu, Hiroshi; Noda, Masaharu; Masuda, Michio

doi:10.1109/tce.1981.273525

“…However, the low transmission efficiency of hole-array plasmonic ACFs restricts their commercial applications for image sensors. On the other hand, image sensors have employed SCFs instead of ACFs to improve the quantum efficiency and spectral response, because SCFs have superior light transmission characteristics [21,22]. Therefore, the proposed plasmonic SCFs with high transmission, simple designs and ultracompact pixel sizes could be a great alternative to colorant color filters and plasmonic ACFs.…”

Section: Discussionmentioning

confidence: 99%

“…red, green, and blue, RGB) from the visible spectrum. Due to their broad passbands with twice the photon throughput of narrowband RGB ACFs, CMY SCFs have the major advantages of higher quantum efficiency and stronger spectral response, and have been successfully used in image sensors for years [21][22][23]. Unfortunately, highly efficient plasmonic SCFs were not possible using exsiting techniques and have not been previously realized.…”

mentioning

confidence: 99%

Ultrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters

Zeng

¹

,

Gao

²

,

Bartoli

³

2013

Sci Rep

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Plasmonic color filters employing a single optically-thick nanostructured metal layer have recently generated considerable interest as an alternative to colorant-based color filtering technologies, due to their reliability, ease of fabrication, and high color tunability. However, their relatively low transmission efficiency (~30%) needs to be significantly improved for practical applications. The present work reports, for the first time, a novel plasmonic subtractive color filtering scheme that exploits the counter-intuitive phenomenon of extraordinary low transmission (ELT) through an ultrathin nanostructured metal film. This approach relies on a fundamentally different color filtering mechanism than that of existing plasmonic additive color filters, and achieves unusually high transmission efficiencies of 60 ~ 70% for simple architectures. Furthermore, owing to short-range interactions of surface plasmon polaritons at ELT resonances, our design offers high spatial resolution color filtering with compact pixel size close to the optical diffraction limit (~λ/2), creating solid applications ranging from imaging sensors to color displays.

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“…The optical microscope image of the color filter mosaic under TM-polarized white light is shown in the bottom panel of Figure 5 (c). Four distinct subtractive colors can be clearly resolved even at the center corner or boundaries of adjacent filters, indicating that the proposed plasmonic SCFs can be applied to highresolution color filter arrays widely used in imaging sensors or color displays 22,23,33 . The image blurring at boundaries arises from effects of light diffraction and the limited optical resolution of the microscope.…”

Section: Resultsmentioning

confidence: 94%

Ultrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters

Zeng

¹

,

Gao

²

,

Bartoli

³

2014

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Plasmonic color filters employing a single optically-thick nanostructured metal layer have recently generated considerable interest as an alternative to colorant-based color filtering technologies, due to their reliability, ease of fabrication, and high color tunability. However, their relatively low transmission efficiency (,30%) needs to be significantly improved for practical applications. The present work reports, for the first time, a novel plasmonic subtractive color filtering scheme that exploits the counter-intuitive phenomenon of extraordinary low transmission (ELT) through an ultrathin nanostructured metal film. This approach relies on a fundamentally different color filtering mechanism than that of existing plasmonic additive color filters, and achieves unusually high transmission efficiencies of 60 , 70% for simple architectures. Furthermore, owing to short-range interactions of surface plasmon polaritons at ELT resonances, our design offers high spatial resolution color filtering with compact pixel size close to the optical diffraction limit (,l/2), creating solid applications ranging from imaging sensors to color displays. N anopatterned ultrathin metal films are investigated for use as highly transmissive plasmonic subtractive color filter arrays with sub-micrometer spatial resolution. This represents an attractive approach for onchip color filters, which are vital components for future displays, image sensors, digital photography, projectors and other optical measurement instrumentation. Previous approaches based on traditional colorant filters employ organic dyes or chemical pigments that are vulnerable to processing chemicals, and undergo performance degradation under long-duration ultraviolet irradiation or at high temperatures. Furthermore, highly-accurate lithographic alignment techniques are required to pattern each type of pixel in a large-area array, significantly increasing fabrication complexity and cost. Plate-like dielectric deflectors have recently been proposed 1 , but this scheme suffers from intrinsic limitations due to poor color purity, since the deflector covers only half of the total area. Nanoplasmonic color filters have been proposed recently as a promising means of overcoming the above limitations [2][3][4][5][6][7][8][9][10][11] . The well-known extraordinary optical transmission (EOT) phenomenon 12-14 , observed in a single opticallythick metal film perforated with a periodic subwavelength hole array, has been extensively studied for additive color filtering (ACF) applications over the past decade. Such plasmonic color filters reject the entire visible spectrum except for selective transmission bands that are associated with the excitation of surface plasmon polaritons (SPPs) 2,6-14 . These EOT transmission bands can be spectrally tuned throughout the entire visible spectrum by simply adjusting geometric parameters, such as the periodicity, shape and size of nanoholes, leading to the high color tunability. Single-layer nanostructured metals also have significant advantage...

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“…(1,2) There are two main types of CFAs: 1) Bayer pattern, which uses the primary colors red, green, and blue (RGB), and 2) complementary color scheme, which uses cyan, magenta, and yellow (CMY). (3,4) However, these conventional dye-doped color filters pose some problems such as color cross talk and additional postprocessing costs. (5) Usually, the color filters account for a major part of the manufacturing cost of a sensing system.…”

Section: Introductionmentioning

confidence: 99%

Highly Sensitive Gate/Body-Tied Metal-Oxide-Semiconductor Field-Effect Transistor-Type Photodetector with Wavelength-Selective Metal Grid Structure Using Standard Complementary Metal-Oxide-Semiconductor Technology

2015

Sensors and Materials

3

0

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In this research, a highly sensitive gate/body-tied metal-oxide-semiconductor fieldeffect transistor (MOSFET)-type photodetector with a wavelength-selective metal grid structure was designed and fabricated using 0.18-μm standard complementary metaloxide-semiconductor technology. This device is composed of a floating gate that is tied to a well and a wavelength-selective metal grid is placed on top of each photodetector. The designed metal grid structure included one-dimensional and two-dimensional patterned metal layers. The amplified photocurrent of the gate/body-tied MOSFETtype photodetector was found to be more than 1000-fold that of a conventional n+/p-sub photodiode with the same area. To demonstrate the wavelength selectivity, we measured the drain current and transmittance of the photodetector as a function of wavelength.

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All Solid State Color Camera With Single-Chip Mos Imager

Cited by 27 publications

References 2 publications

Ultrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters

Ultrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters

Ultrathin Nanostructured Metals for Highly Transmissive Plasmonic Subtractive Color Filters

Highly Sensitive Gate/Body-Tied Metal-Oxide-Semiconductor Field-Effect Transistor-Type Photodetector with Wavelength-Selective Metal Grid Structure Using Standard Complementary Metal-Oxide-Semiconductor Technology

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