“…Contrary to metals (Au, Ag, and Al), in which the density of free electrons is fixed and the resulting resonance frequencies are mainly located in the visible and near-infrared (VIS-NIR) spectral range [11], the plasmon resonance in doped semiconductors can be tuned over a broad spectral window, ranging from NIR to far-infrared (FIR) by controlling the carrier concentration [12,15,[21][22][23][24][25][26]. Among hyperdoped semiconductor materials, Si is the most desired material for plasmonic applications in the MIR spectral range, owing to its compatibility with the complementary metal-oxidesemiconductor (CMOS) technology [21,22,[27][28][29][30][31][32]. Moreover, a plasmonic material based on doped Si has certain advantages over other doped semiconductors, such as cost-effectiveness, environmental friendliness and the well-developed and versatile fabrication process.…”