2017
DOI: 10.3390/mi8010006
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All-Semiconductor Plasmonic Resonator for Surface-Enhanced Infrared Absorption Spectroscopy

Abstract: Infrared absorption spectroscopy remains a challenge due to the weak light-matter interaction between micron-wavelengthed infrared light and nano-sized molecules. A highly doped semiconductor supports intrinsic plasmon modes at infrared frequencies, and is compatible with the current epitaxial growth processing, which makes it promising for various applications. Here, we propose an all-semiconductor plasmonic resonator to enhance the infrared absorption of the adsorbed molecules. An optical model is employed t… Show more

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Cited by 10 publications
(6 citation statements)
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“…We then considered the electromagnetic coupling between the guide modes and infrared vibrational modes of molecules to explore the performance of the proposed SEIRAS substrate. The dielectric constant of the molecules can be described as the Drude-Lorentz type dispersion [35,36]…”
Section: Seiras Substrate Employing Angle-tunable Absorbermentioning
confidence: 99%
“…We then considered the electromagnetic coupling between the guide modes and infrared vibrational modes of molecules to explore the performance of the proposed SEIRAS substrate. The dielectric constant of the molecules can be described as the Drude-Lorentz type dispersion [35,36]…”
Section: Seiras Substrate Employing Angle-tunable Absorbermentioning
confidence: 99%
“…12,15,[21][22][23][24][25][26] Among hyperdoped semiconductor materials, Si is the most desired material for plasmonic applications in the MIR spectral range, owing to its compatibility with the complementary metal-oxide-semiconductor (CMOS) technology. 21,22,[27][28][29][30][31][32] Moreover, a plasmonic material based on doped Si has certain advantages over other doped semiconductors, such as cost-effectiveness, environmental friendliness and the well-developed and versatile fabrication process. Importantly, compared to III-V semiconductors, the absence of optical phonon absorption in the FIR spectral range in Si will naturally reduce the plasmon losses since Si is a non-polar semiconductor.…”
Section: Introductionmentioning
confidence: 99%
“…Contrary to metals (Au, Ag, and Al), in which the density of free electrons is fixed and the resulting resonance frequencies are mainly located in the visible and near-infrared (VIS-NIR) spectral range [11], the plasmon resonance in doped semiconductors can be tuned over a broad spectral window, ranging from NIR to far-infrared (FIR) by controlling the carrier concentration [12,15,[21][22][23][24][25][26]. Among hyperdoped semiconductor materials, Si is the most desired material for plasmonic applications in the MIR spectral range, owing to its compatibility with the complementary metal-oxidesemiconductor (CMOS) technology [21,22,[27][28][29][30][31][32]. Moreover, a plasmonic material based on doped Si has certain advantages over other doped semiconductors, such as cost-effectiveness, environmental friendliness and the well-developed and versatile fabrication process.…”
Section: Introductionmentioning
confidence: 99%
“…The first SEIRA studies used mainly noble metals (Ag, 4 Au, 5 and less frequently Cu 6 ). Later reports showed the possibility of using other metals, 7−14 semiconductors, 15 and polar dielectric nanostructures. 16 The SEIRA effect is mainly studied on chemically deposited and vapor-deposited metal island films, nanoparticle decorated films, 5 periodic array-based substrates (consisting of particles and holes), 17 and less frequently metal sols.…”
Section: ■ Introductionmentioning
confidence: 99%
“…The first SEIRA studies used mainly noble metals (Ag, Au, and less frequently Cu). Later reports showed the possibility of using other metals, semiconductors, and polar dielectric nanostructures …”
Section: Introductionmentioning
confidence: 99%