2021
DOI: 10.1016/j.physe.2021.114869
|View full text |Cite
|
Sign up to set email alerts
|

AlAs/SiH van der Waals heterostructures: A promising photocatalyst for water splitting

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

3
21
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 23 publications
(24 citation statements)
references
References 51 publications
3
21
0
Order By: Relevance
“…This interlayer spacing is in the same order of magnitude as other Si(Ge)H-based heterostructures, such as GeH/graphene, 48 SiH/PtSe 2 , 47 and SiH/AlAs. 49 Moreover, to check the structural stability of such a heterostructure, we further calculate the binding energy as: The generation of type-II band alignment in the MoS 2 /SiH HTS may lead to charge redistribution at the interface. Therefore, we further visualize the charge density difference as Dr ¼ r H À r M À r S , where r H , r M and r S are the charge densities of the MoS 2 /SiH HTS, and isolated MoS 2 and SiH monolayers, respectively.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…This interlayer spacing is in the same order of magnitude as other Si(Ge)H-based heterostructures, such as GeH/graphene, 48 SiH/PtSe 2 , 47 and SiH/AlAs. 49 Moreover, to check the structural stability of such a heterostructure, we further calculate the binding energy as: The generation of type-II band alignment in the MoS 2 /SiH HTS may lead to charge redistribution at the interface. Therefore, we further visualize the charge density difference as Dr ¼ r H À r M À r S , where r H , r M and r S are the charge densities of the MoS 2 /SiH HTS, and isolated MoS 2 and SiH monolayers, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…This interlayer spacing is in the same order of magnitude as other Si(Ge)H-based heterostructures, such as GeH/graphene, 48 SiH/PtSe 2 , 47 and SiH/AlAs. 49 Moreover, to check the structural stability of such a heterostructure, we further calculate the binding energy as: E b = [ E H − ( E M − E S )]/ A , where E H , E M and E S are the total energies of the MoS 2 /SiH heterostructure, and isolated MoS 2 and SiH monolayers, respectively. A is the surface area of the MoS 2 /SiH HTS.…”
Section: Resultsmentioning
confidence: 99%
“…One can find that this interlayer separation is in good agreement with that in the SiH-based heterostructure. 35,37 Furthermore, to evaluate the structural stability of the SiH/MoSi 2 N 4 heterostructure, the binding energy was calculated as…”
Section: Resultsmentioning
confidence: 99%
“…[26][27][28][29] The SiH-based and MoSi 2 N 4 -based heterostructures have also been discovered and predicted. [30][31][32][33][34][35][36][37][38] However, the heterostructure between SiH and MoSi 2 N 4 has not yet been composed and investigated. Therefore, in this work, we design a SiH/MoSi 2 N 4 heterostructure and examine its electronic properties and contact characteristics using firstprinciples calculations.…”
Section: Introductionmentioning
confidence: 99%
“…All of these results are in good agreement with the published results for the same levels. [23,25,26,31,43]…”
Section: Monolayer Gan and Sihmentioning
confidence: 99%