Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

Alumina-supported sub-nanometer Pt10 clusters: amorphization and role of the support material in a highly active CO oxidation catalyst

“…Experimentally, hydroxyls are found at ambient conditions, but their number gradually decreases as the temperature is raised until they finally disappear around 500 C. 16 Our model thus represents an alumina which, being fully dehydroxylated, realizes maximum adhesion of Pt clusters. Together with the results in the gas phase, this allows us to bracket the system's energetics and catalytic behavior.…”

Localized Surface Plasmon Resonance Nanosensor: A High-Resolution Distance-Dependence Study Using Atomic Layer Deposition

“…After each cycle, a LSPR extinction spectrum was collected which presents a highly detailed view of the short-range distance dependence of the LSPR nanosensor. Because Al 2 O 3 layers deposited by ALD are ∼1.1 Å in thickness, 11 this is the first time that extremely detailed pictures of both the short-and long-range distance dependences of the LSPR nanosensor have been obtained in a single integrated experiment. In fact, the results in this work show that at short distances from the nanoparticle surface, the LSPR λ max shift vs layer thickness follows a steep linear trend compared with the moderate slope at a larger distance from the nanoparticle surface.…”

“…10 Highly uniform monolayers of Al 2 O 3 can be deposited with ∼1 Å thickness resolution and a refractive index of 1.57. 11,12 Depositing Al 2 O 3 multilayers onto the noble metal nanosensor should allow the long-range distance dependence of the LSPR nanosensor to be probed with 10x spatial resolution compared with previous work. 7 In this paper, we have utilized ALD of Al 2 O 3 to probe both the long-and short-range LSPR distance dependences of Ag nanoparticles in one integrated experiment.…”

In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

“…Especially the thermal process for Al 2 O 3 ALD from trimethylaluminum ͓Al͑CH 3 ͒ 3 ͔ and H 2 O, which can be considered as a model system for ALD, 1 has been examined quite thoroughly both experimentally and theoretically. [2][3][4][5][6][7][8][9] Details about the reaction mechanism have been established for this process, which is ruled by ͑i͒ chemisorption of Al͑CH 3 ͒ 3 on -OH surface groups forming adsorbed ͑-O -͒ n Al͑CH 3 ͒ 3−n by splitting off one of more ligands in the form of CH 4 and ͑ii͒ the oxidation of the metal by H 2 O regenerating -OH surface groups while forming CH 4 .…”