Al thin film: The effect of substrate type on Al film formation and morphology

Khachatryan, Hayk; Lee, Sung‐Nam; Kim, Kyoung‐Bo; Kim, Han−Ki; Kim, Moojin

doi:10.1016/j.jpcs.2018.06.018

Cited by 28 publications

(7 citation statements)

References 12 publications

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“…The first substrate was a crystalline metal which has typical metallic bonds, the second was silicon wafer, which is a crystalline metalloid with covalent bonds, and the third substrate was non-crystalline glass having an amorphous structure. The effect of substrate types on the growth process was covered in our previous work [21]. The review [17] and references therein also revealed that substrates may have a critical influence on the morphology of the formed film.…”

Section: Resultsmentioning

confidence: 97%

Deposition of Al Thin Film on Steel Substrate: The Role of Thickness on Crystallization and Grain Growth

Khachatryan

Lee

Kim

et al. 2018

Metals

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In this study, we deposited aluminum (Al) films of different thicknesses on steel substrate and examined their phase, microstructure, and film growth process. We estimated that films of up to 30 nm thickness were mainly amorphous in nature. When the film thickness exceeded 30 nm, crystallization was observed. The further increase in film thickness triggered grain growth, and the formation of grains up to 40 nm occurred. In such cases, the Al film had a cross-grained structure with well-developed primary grains networks that were filled with small secondary grains. We demonstrated that the microstructure played a key role in optical properties. The films below 30 nm showed higher specular reflection, whereas thicker films showed higher diffuse reflections.

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Section: Resultsmentioning

confidence: 97%

Deposition of Al Thin Film on Steel Substrate: The Role of Thickness on Crystallization and Grain Growth

Khachatryan

Lee

Kim

et al. 2018

Metals

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“…The highest Df is obtained on Al films deposited on pure titanium and lowest for films on Ti6Al4V substrates. These observations indicate dependence on fractal behaviour on the type of substrate and therefore it means that substrates affect the growth of films in a sputtering process [24].…”

Section: Fractal Analysesmentioning

confidence: 89%

“…The average maximum height (Table 2) is highest for films sputtered on mild steel substrates and lowest for those on stainless steel. This parameter can be related to the growth mechanism of the features during the sputtering process and it can be seen in this case that the growth of Al films varies for different substrates [24]. When the atoms of the target overlay on each other during diffusion on the substrate, a localised higher average maximum height is recorded.…”

Section: Topographic Observationsmentioning

confidence: 99%

Effect of Substrate Type on the Fractal Characteristics of AFM Images of Sputtered Aluminium Thin Films

Mwema

Akinlabi

Oladijo

2019

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The roughness features of aluminum thin films deposited by radio-frequency magnetron sputtering on Ti6Al4V, stainless steel, mild steel and commercially pure titanium substrates are studied via atomic force microscopy. The average roughness, interface width, skewness, kurtosis, roughness exponent, equivalent roughness, lateral correlation length, fractal dimension and Minkowski functionals have been computed for each sample. It is shown that both topology and fractal characteristics of the Al thin films are greatly influenced by the type of metallic substrate on which it is sputtered. The fractal studies reveal that the fractal dimensions range between 2 and 3, indicating that all the surfaces are self-affine. The Minkowski functionals show that the valleys and plateaus for all the surfaces are highly disconnected since very small positive values of Euler-Poincaré are computed. The differences in roughness characteristics are superficial indication that substrate types affect the nucleation and growth of surface features such as grain sizes and particles during sputtering.

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“…Various studies have been undertaken to evaluate the effect of different factors on properties of aluminium thin films (Her & Wang, 2015;Kao & Lin, 2012;, 2018Mwema, Oladijo, Sathiaraj et al, 2018;Martin et al, 1995;Pakhuruddin et al, 2012;Qiu et al, 2002). The effect of the type of substrate on the structural evolution of Al thin films has been reported recently (Khachatryan et al, 2018) and shown that larger and well-defined grain sizes are formed when deposited on metallic substrates. Sputtering is one of the attractive techniques of preparing aluminium thin films (D'Heurle, 1970) and it is controlled by various process parameters including temperature, power, argon gas flowrate, bias voltage, etc.…”

Section: Introductionmentioning

confidence: 99%

Microstructure and scratch analysis of aluminium thin films sputtered at varying RF power on stainless steel substrates

et al. 2020

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Aluminium (Al) thin films (thickness ranging between 500 and 600 nm) were deposited on stainless-steel substrates at varying radio-frequency (RF) power by magnetron sputtering at a constant substrate temperature of 90°C. Characterisations were undertaken by field emission scanning electron microscopy (FESEM), optical surface profilometry (OSP), atomic force microscopy (AFM), X-ray diffraction (XRD), selected Fourier-transform infrared spectroscopy (FTIR), nanoindentation, and micro-scratch tests. At high RF powers (300-350 W), there was the formation of less porous, dense, and continuous Al thin films with better resistance to scratch failure. The high roughness on films deposited at 200 and 250 W was due to high porosity and oxides observed on the FESEM micrographs.

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Al thin film: The effect of substrate type on Al film formation and morphology

Cited by 28 publications

References 12 publications

Deposition of Al Thin Film on Steel Substrate: The Role of Thickness on Crystallization and Grain Growth

Deposition of Al Thin Film on Steel Substrate: The Role of Thickness on Crystallization and Grain Growth

Effect of Substrate Type on the Fractal Characteristics of AFM Images of Sputtered Aluminium Thin Films

Microstructure and scratch analysis of aluminium thin films sputtered at varying RF power on stainless steel substrates

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