AI-Powered Process Optimization for EUV MOR: Equipment Trace Data Feature Extraction and Machine Learning is Essential for CD Control

Finlay, Boyd; Faria, Mario; Gueci, Steven; Holzer, Eric; Latham, Nicholas; Ortega, Francis

doi:10.1109/asmc61125.2024.10545368

2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) 2024

DOI: 10.1109/asmc61125.2024.10545368

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AI-Powered Process Optimization for EUV MOR: Equipment Trace Data Feature Extraction and Machine Learning is Essential for CD Control

Boyd Finlay,

Mario Faria,

Steven Gueci

et al.

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AI-Powered Process Optimization for EUV MOR: Equipment Trace Data Feature Extraction and Machine Learning is Essential for CD Control

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