One of the problems in the use of inorganic silica membranes is their instability against water or water vapor, a problem that results from the dissolution and rearrangements of silica networks. In this work Ni(NO 3 ) . 6H 2 O was added to silica sol for fabrication of Ni-doped silica membranes by sol-gel techniques in order to prevent the densification of amorphous silica networks in a humid atmosphere at 50 -3008C. A fresh Ni-doped silica membrane (Si/Ni ¼ 2/1) fired at 5008C showed a large He permeance of about 2.6 Â 10 25 [m 3 (STP)/(m 2 . s . kPa)] with a selectivity of 600 (He/CH 4 ) at 3008C. After the Ni-doped silica membrane was left in humid air (408C, 60% RH) for 4 days, the He permeance decreased slightly (by 5%) with a larger selectivity of 800 (He/CH 4 ) at 3008C. However, little change was observed in the activation energy of He permeation, suggesting that nickel oxides added to silica can preferably prevent the densification of silica networks through which only H 2 and He can permeate. Humid He and CH 4 showed smaller permeabilities, especially at temperatures below 1508C, than those of dry gases because of condensed and/or adsorbed H 2 O molecules in silica networks and on grain boundaries.Separation of He/CH 4 mixtures with the fresh Ni-doped silica membrane (Si/Ni ¼ 2/1) at 3008C gave relatively good results and coincided well with the predicted values with the ideal permeance ratio, 600.