Aggregation of n-doped polystyrene-polyparaphenylene block copolymers: a neutron scattering study

Rawiso, M.; Widawski, Gilles; François, B.

doi:10.1016/0379-6779(94)02539-b

Cited by 6 publications

(3 citation statements)

References 8 publications

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“…Furthermore, block copolymers can improve mechanical and photophysical properties, compared to individual component homopolymers by the formation of well-defined macrostructures based on stable, chemically inter-linked microstructures. 85,86 For instance, PPP/ PS block copolymers have been reported to form micelles in a wide range of organic solvents with PPP cores surrounded by PS shells, 87 and thin films of PPP/PS/PPP self-organize into a honeycomb-like morphology 86 presenting promising electroluminescence properties. With the interesting morphology in mind, Franc ¸ois et al attempted the synthesis of C 60 containing PPP polymers in 2002.…”

Section: Polyphenylene-based Block Copolymersmentioning

confidence: 99%

Controlled polymerizations for the synthesis of semiconducting conjugated polymers

2011

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Section: Polyphenylene-based Block Copolymersmentioning

confidence: 99%

Controlled polymerizations for the synthesis of semiconducting conjugated polymers

2011

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“…A major drawback with a blend 17,18 or a block copolymer [19][20][21] is that because the conducting polymer is a rigid rod and the other polymer is a flexible coil, the conducting polymer strongly phase separates out of the matrix. The conducting polymer needs to have an unbroken length of conjugated monomers for the conduction mechanism.…”

Section: Molecular Designmentioning

confidence: 99%

Copolymer approach to charge-dissipating electron-beam resists

Hupcey¹

1998

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Negative electron-beam nanofabrication resist using acid-catalyzed protection of polyphenol provided by phenylcarbinol J.Accurate critical dimension control by using an azide/novolak resist process for electron-beam lithography During electron-beam lithographic exposure on insulating substrates, pattern distortions and displacements are observed due to charging of the surface. To alleviate these displacements, conducting polymers have been investigated in the past decade as negative-tone resists and as unimageable top or bottom layers in a multilayer stack. Our approach uses a graft copolymer: an acrylic backbone for the imaging performance of the resist and a conducting polymer grafted onto the backbone for the charge-dissipating performance. By using this system, the respective properties of the two components can be individually optimized for such properties as speed, etch resistance, solubility, and conductivity. This system also permits positive-tone single-layer imaging, which has not been achievable previously. High-resolution features ͑Ͻ0.10 m͒, minimal pattern distortions, and no change in the clearing dose, were observed for graft copolymers containing Ͻ1% of the charge-dissipating component that were processed identically to commercially available PMMA resist.

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“…The self‐assembly of PS‐ b ‐PCHD is significantly different from common PS‐ b ‐polydiene copolymers yielding a core‐shell cylinder morphology for a simple diblock copolymer 19. The PCHD blocks in PS‐ b‐ PCHD having relatively short PCHD blocks have been aromatized,20–22 and selectively sulfonated 23. All of these chemically modified PS‐ b ‐PCHD block copolymers exhibit interesting self‐assembly in bulk or in aqueous solutions 23, 24…”

Section: Introductionmentioning

confidence: 99%

Novel amphiphilic block copolymers derived from the selective fluorination and sulfonation of poly(styrene‐block‐1,3‐cyclohexadiene)

Huang

Messman

Hong

et al. 2011

J. Polym. Sci. A Polym. Chem.

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Diblock copolymers of polystyrene‐block‐(1,3‐cyclohexadiene) (PS‐b‐PCHD), with varied molecular weights and compositions, were synthesized by sequential polymerization of styrene and 1,3‐cyclohexadiene (CHD) initiated by sec‐butyllithium in cyclohexane in the presence of appropriate additives during formation of the PCHD block. The residual double bonds in the PCHD block were saturated by addition of in situ generated difluorocarbene and/or hydrogen to enhance thermal and chemical stability. The fluorinated and/or hydrogenated polydiene blocks were chemically stable, allowing for controlled sulfonation of the PS blocks using acetyl sulfate. 1H NMR and FT‐IR characterization confirmed successful fluorination/hydrogenation and sulfonation of the respective blocks. The resulting amphiphilic block copolymers consist of a semiflexible fluorine‐containing hydrophobic block having a bridged double ring structure and a hydrophilic sulfonated PS block. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012

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Aggregation of n-doped polystyrene-polyparaphenylene block copolymers: a neutron scattering study

Cited by 6 publications

References 8 publications

Controlled polymerizations for the synthesis of semiconducting conjugated polymers

Controlled polymerizations for the synthesis of semiconducting conjugated polymers

Copolymer approach to charge-dissipating electron-beam resists

Novel amphiphilic block copolymers derived from the selective fluorination and sulfonation of poly(styrene‐block‐1,3‐cyclohexadiene)

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