2018
DOI: 10.1109/jlt.2018.2848699
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Aerosol-Jet Printed Interconnects for 2.5 D Electronic and Photonic Integration

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Cited by 9 publications
(5 citation statements)
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“…Among the existing printing methods, aerosol jet printing is the most promising technology because it allows the formation of functional elements with a minimum lateral size of up to 10 microns [7][8][9] both on flat and curved substrates [10,11]. This technology has been applied for the manufacture of transistors [12], sensors [13][14][15], solar cells [16], microheaters [17], microantennas [18,19] and interconnects [20]. Previous studies of this technology relied mainly on the formation of thin-film microstructures due to the need for the manufacture of planar electronic devices.…”
Section: Introductionmentioning
confidence: 99%
“…Among the existing printing methods, aerosol jet printing is the most promising technology because it allows the formation of functional elements with a minimum lateral size of up to 10 microns [7][8][9] both on flat and curved substrates [10,11]. This technology has been applied for the manufacture of transistors [12], sensors [13][14][15], solar cells [16], microheaters [17], microantennas [18,19] and interconnects [20]. Previous studies of this technology relied mainly on the formation of thin-film microstructures due to the need for the manufacture of planar electronic devices.…”
Section: Introductionmentioning
confidence: 99%
“…The Ag ink from Clariant has a sheet resistance of 0.024 Ω/Square and the Au ink from UTDots has a sheet resistance of 0.129 Ω/Square. Both inks have been demonstrated in printed FHE devices such as strain gauges, capacitor electrodes, interconnects and coplanar waveguide (CPW) lines [13][14][15][16][17]. An Optomec AJ300 aerosol jet printer was used for this work.…”
Section: Sample Fabricationmentioning
confidence: 99%
“…[11,12] Uniquely, these tools use both pneumatic and ultrasonic atomization to generate a fine mist (i.e., <5 μm droplet diameter) from precursor inks and digitally pattern them through a highly collimated beam. Accordingly, this technology has been used to pattern conductive tracks for a wide range of applications, including strain sensing, [13][14][15] on-chip interconnects for electronic packaging, [16][17][18] and printed transistors, [19,20] for increased densification of electronic subsystems and their incorporation into nonplanar form factors.…”
Section: Introductionmentioning
confidence: 99%