Aerosol assisted chemical vapour deposition of transparent conductive aluminum-doped zinc oxide thin films from a zinc triflate precursor

Abstract

The use of zinc triflate (trifluoromethanesulfonate), [Zn(OTf)2] as a precursor in the aerosol assisted chemical vapour deposition of zinc oxide thin films is described. Aluminum doped zinc oxide (AZO) thin films are also shown to be deposited when aluminum acetylacetonate [Al(acac)3] was introduced into the precursor solution, illustrating the versatility of this system. Film characterization techniques include glancing angle X-ray powder diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy and optical and electrical measurements. AZO films with an Al content of 7 at.% were found to have favourable transparent conducting oxide properties with simultaneous high transparency (> 80 %) in the visible light region and a low electrical resistivity (1.96 × 10 -3 Ω cm).

Aluminium/gallium, indium/gallium, and aluminium/indium co-doped ZnO thin films deposited via aerosol assisted CVD

“…17 Aluminiumdoped ZnO (AZO), gallium-doped ZnO (GZO), and indium-doped ZnO (IZO) thin films have been prepared by various techniques, including magnetron sputtering, [18][19][20] pulsed laser deposition (PLD), [21][22][23] molecular beam epitaxy (MBE), 24,25 atomic layer deposition (ALD), [26][27][28] spray pyrolysis, 29,30 atmospheric pressure chemical vapour deposition (APCVD), [31][32][33] and aerosol assisted chemical vapour deposition (AACVD). [34][35][36] Moreover, co-doped ZnO films have been prepared using these dopants. Co-doping allows the benefits of two dopants to be exploited simultaneously.…”

The effect of solvent on Al-doped ZnO thin films depositedviaaerosol assisted CVD

“…However, due to the relatively high and unstable price of raw indium and tin, cheaper alternatives are highly sought after. 8 One of the main substitute TCO materials that has emerged is aluminium-doped zinc oxide (AZO), due to the inexpensive precursors, the wide band gap of ZnO ( ca. 3.37 eV at room temperature), and the n-type conductivity.…”

Photocatalytic and electrically conductive transparent Cl-doped ZnO thin films via aerosol-assisted chemical vapour deposition

“…[8][9][10][11][12] Doping is a strategy to enhance the electrical conductivity of TCO materials. Cation dopants such as Al 3+ , Ga 3+ , In 3+ , [13][14][15][16][17][18][19] Sc 3+ , 20 Si 4+ (ref. 21 and 22) and Cu 23 and anion dopants such as F À , 16,24,25 Cl À (ref.…”