2011
DOI: 10.1016/j.tsf.2011.01.143
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Advantages of transparent conducting oxide thin films with controlled permittivity for thin film photovoltaic solar cells

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Cited by 29 publications
(9 citation statements)
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“…The high transparency comes from the combination of a wide optical band gap-due to high free carrier densities (Burstein-Moss shift) and a low free-carrier absorption in the IR-due to the high mobility-. In fact, it has also been proposed that the improved IR transmittance originates from a modification of the permittivity of the material with adding ZrO2 [16]. We optimized IO:Zr for application as the front electrode in SHJ solar cells, and compare the solar cell properties to reference In-based electrodes, mainly ITO and IO:H. As the fabrication of this high-performing electrode does not require the intentional introduction of water during deposition to achieve high mobilities, and its high conductivity will allow a reduction of this layer thickness by almost half, IO:Zr is a strong candidate for next-generation TCO in industrial production with reduce cost as compare to standard ITO [17] [18].…”
Section: Introductionmentioning
confidence: 99%
“…The high transparency comes from the combination of a wide optical band gap-due to high free carrier densities (Burstein-Moss shift) and a low free-carrier absorption in the IR-due to the high mobility-. In fact, it has also been proposed that the improved IR transmittance originates from a modification of the permittivity of the material with adding ZrO2 [16]. We optimized IO:Zr for application as the front electrode in SHJ solar cells, and compare the solar cell properties to reference In-based electrodes, mainly ITO and IO:H. As the fabrication of this high-performing electrode does not require the intentional introduction of water during deposition to achieve high mobilities, and its high conductivity will allow a reduction of this layer thickness by almost half, IO:Zr is a strong candidate for next-generation TCO in industrial production with reduce cost as compare to standard ITO [17] [18].…”
Section: Introductionmentioning
confidence: 99%
“…Here, we include few experimental results of RIE textured glass surface morphologies [21][22][23][24]. Various etching chemistries are generally used for glass etching.…”
Section: Plasma Textured Glass Surface Morphologiesmentioning
confidence: 99%
“…Thus, the textured glass surface substrates with nano-and micro size features can be employed to scatter light in lower as well as in longer wavelength region. Recently, textured glass surface morphologies with high rms roughness and haze ratio were proposed for high efficiency a-Si TFSCs due to their superior electrical and optical characteristics as compared to textured TCO films [15,[16][17][18][19][20][21][22][23][24][25].…”
Section: Introductionmentioning
confidence: 99%
“…Another possibility to raise p is to tune the dielectric permittivity of the TCO window through the judicious doping by a high-permittivity material (e.g. ZrO 2 ) [19].…”
Section: Introductionmentioning
confidence: 99%