2012
DOI: 10.1039/c1sc00522g
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Advances in the deposition chemistry of metal-containing thin films using gas phase processes

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Cited by 29 publications
(28 citation statements)
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References 117 publications
(146 reference statements)
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“…Soft wet‐chemical synthesis in organic solvents from metal–organic complexes is an important method to obtain metal or metal alloy nanoparticles . Metal amidinates are important precursors for metal nanoparticles for thin metal films from low‐pressure chemical vapor deposition (CVD) and atomic layer deposition (ALD) …”
Section: Introductionmentioning
confidence: 99%
“…Soft wet‐chemical synthesis in organic solvents from metal–organic complexes is an important method to obtain metal or metal alloy nanoparticles . Metal amidinates are important precursors for metal nanoparticles for thin metal films from low‐pressure chemical vapor deposition (CVD) and atomic layer deposition (ALD) …”
Section: Introductionmentioning
confidence: 99%
“…The deposition parameters are: temperature substrate = 450 °C; oxygen flow = 2000 standard cubic centimetres (sccm); nitrogen flow = 850 sccm; total process pressure = 12 mbar. A detailed description of the deposition approach fabrication can be found elsewhere 35 . The annealing processes were performed in a Rapid Thermal Annealing reactor (Annealsys) under Argon, under vacuum or at high oxygen partial pressure (in same conditions as during the deposition) and the changes in conductivity were not significantly depending on the annealing atmosphere.…”
Section: Methodsmentioning
confidence: 99%
“…Soft, wet‐chemical synthesis in organic solvents from metal–organic complexes is an important route to nanometals and allows the preparation of metals and alloys in the nanometer scale regime . Metal amidinates (Scheme ) have been investigated and widely used as precursors for metal nanoparticles and thin metal films in low‐pressure chemical vapor deposition (CVD) or atomic layer deposition (ALD) …”
Section: Introductionmentioning
confidence: 99%