Advances in Step and Flash imprint lithography

Johnson, Stephen C.; Bailey, Todd; Dickey, Michael D.; Smith, B. J.; Kim, Eunha K.; Jamieson, Andrew; Stacey, Nick; Ekerdt, John G.; Willson, C. Grant; Mancini, David P.; Dauksher, William J.; Nordquist, Kevin J.; Resnick, Douglas J.

doi:10.1117/12.484985

Cited by 30 publications

(15 citation statements)

References 6 publications

(5 reference statements)

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“…Step‐and‐flash imprint lithography (SFIL),30–32 a UV‐NIL variant, is particularly attractive because of the high feature density that can be obtained and the high efficiency in replicating multiple and complex pattern types on the same mold 30. In SFIL, a low viscosity, photocurable liquid or solution is dispensed in the form of small droplets (as opposed to spin coating) onto the substrate to fill the voids of a quartz mold.…”

Section: Introductionmentioning

confidence: 99%

Nanostructured Polymer Brushes by UV‐Assisted Imprint Lithography and Surface‐Initiated Polymerization for Biological Functions

Benetti

Acikgöz

Sui

et al. 2011

Adv Funct Materials

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Section: Introductionmentioning

confidence: 99%

Nanostructured Polymer Brushes by UV‐Assisted Imprint Lithography and Surface‐Initiated Polymerization for Biological Functions

Benetti

Acikgöz

Sui

et al. 2011

Adv Funct Materials

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“…It contains Si and is composed of 44% (3-acryloxypropyl)tris(trimethylsiloxy)silane (Gelest), 37% t-butyl acrylate, 15% 1,3 butanediol diacrylate and 4% Darocur. 11,13 All resist components were used without further purification.…”

Section: Introductionmentioning

confidence: 99%

Adhesion between template materials and UV-cured nanoimprint resists

et al. 2006

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The origins of defects in lithographic stencils fabricated by the UV-cure nanoimprint technique include fundamental surface interactions between template and resist in addition to the presence of particles and contaminants. Repeated, molecularly clean separations of the template from the newly cured resist is a requirement, yet rather little is understood about the separation process or underlying interfacial physics and chemistry. We have investigated the chemical and physical interactions of several model acrylate nanoimprint resist formulations cured in contact with clean and releasetreated quartz surfaces, then separated from them. The results show that fracture energies are resist formulationdependent, that the resist-release layer systems studied are not chemically stable and that release process is more complex than simple fracture at a glass-organic interface.

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“…17 Kinetic results for the extent of reaction are shown in Fig. 5 for an acrylate based etch barrier formulation with a varying initiator concentration.…”

Section: Mesoscale Modelingmentioning

confidence: 99%

“…Our group has characterized this issue in some detail previously with both modeling and experimental efforts. 17 However, oxygen inhibition effects are not currently included in the model discussed here, and the model curves in Fig. 5 were displaced to account for the inhibition period.…”

Section: Mesoscale Modelingmentioning

confidence: 99%

Mesoscale modeling for SFIL simulating polymerization kinetics and densification

et al. 2004

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Step and Flash Imprint Lithography (SFIL) is a revolutionary next generation lithography option that has become increasingly attractive in recent years. Elimination of the costly optics of current step and scan imaging tools makes SFIL a serious candidate for large-scale commercial patterning of critical dimensions below ~50 nm. This work focuses on the kinetics of the UV curing of the liquid etch barrier and the resulting densification/contraction of the etch barrier as it solidifies during this step. Previous experimental work in our group has measured the bulk densification of several etch barrier formulations, typically about 9 % (v/v). It remains unknown, however, how much etch barrier contraction occurs during the formation of nano-scale features. Furthermore, it is of interest to examine how changes in monomer pendant group size impact imprinted feature profiles.This work provides answers to these questions through a combination of modeling and experimental efforts. Densification due to the photopolymerization reaction and the resulting shift from Van der Waals' to covalent interactions is modeled using Monte-Carlo techniques. The model allows for determination of extent of reaction, degree of polymerization, and local density changes as a function of the etch barrier formulation and the interaction energies between molecules (including the quartz template). Experimental efforts focus on a new technique to examine trench profiles in the quartz template using TEM characterization. Additionally, SEM images of imprinted images from various etch barrier formulations were examined to determine local contraction of the etch barrier. Over a large range of etch barrier formulations, which range from 10 -20 % volumetric contraction as bulk materials, it was found that dense 100 nm lines printed approximately the same size and shape.

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Advances in Step and Flash imprint lithography

Cited by 30 publications

References 6 publications

Nanostructured Polymer Brushes by UV‐Assisted Imprint Lithography and Surface‐Initiated Polymerization for Biological Functions

Nanostructured Polymer Brushes by UV‐Assisted Imprint Lithography and Surface‐Initiated Polymerization for Biological Functions

Adhesion between template materials and UV-cured nanoimprint resists

Mesoscale modeling for SFIL simulating polymerization kinetics and densification

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