Solar cells formed with thin silicon active layers (<100 μm thick) offer advantages over thick ingot-based devices. The advantages come in two forms: the first is the potential for higher conversion efficiency than that of conventional thick devices, and the second is a reduction in material requirements. The use of thin polycrystalline silicon for solar cells offers the potential of capturing the high performance of crystalline silicon while achieving the potential low cost of thin films. Experimental and theoretical studies initially uncovered the issues of grain size and thickness as limiting factors. Subsequent work added the issue of back-surface passivation. This article addresses the conditions required for the successful development of polycrystalline silicon into a high efficiency, low-cost, terrestrial product.