2021
DOI: 10.1016/j.vacuum.2020.109991
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Advanced VLS growth of gold encrusted silicon nanowires Mediated by porous Aluminium Oxide template

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Cited by 11 publications
(8 citation statements)
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“…By making a master stamp with a nanostructure to transfer concavity to the aluminum substrate, the surface of the patterned aluminum foil can be obtained; then, followed by anodization, AAO is formed with regular pores due to the effect of the electric field concentration. The other process is conducted by sputtering Al to a substrate material e.g., Si [124][125][126][127] (Section 2.3). This method can integrate AAO with different substrates for further application.…”
Section: Advancement Of Aao Template and Its Geometry At Low Temperat...mentioning
confidence: 99%
“…By making a master stamp with a nanostructure to transfer concavity to the aluminum substrate, the surface of the patterned aluminum foil can be obtained; then, followed by anodization, AAO is formed with regular pores due to the effect of the electric field concentration. The other process is conducted by sputtering Al to a substrate material e.g., Si [124][125][126][127] (Section 2.3). This method can integrate AAO with different substrates for further application.…”
Section: Advancement Of Aao Template and Its Geometry At Low Temperat...mentioning
confidence: 99%
“…В рамках першого підходу можна назвати наступні технологічні методи синтезу SiNWs : метало-стимульоване хімічне травлення (Metal Assisted Chemical Etching -MACE або MacEtch ) [33] та літографія з травленням (Lithography and Etching) [34]. В рамках другого підходу можна назвати наступні технологічні методи синтезу SiNWs : метод хімічного газофазного осадження (Chemical Vapor Deposition -CVD ) [35] та метод вирощування пара-рідина-тверде тіло (Vapor-Liquid-Solid -VLS growth ) [36].…”
Section: методи виготовлення та структурні особливості кремнієвих нан...unclassified
“…Though many strategies have been adopted to tailor successfully the size of the catalyst droplets in the VLS growth approach, such as electron beam lithography (EBL) catalyst patterning 43 and template assisted growth. 44 Recently, we also explored the use of EBL to pattern narrow stripes of indium (In) catalyst, with initial width down to 100 nm, and found that this size confinement is beneficial for forming uniform rows of In droplets. 45 However, all of these sophisticated catalyst formation technologies are not applicable for integration of electronics.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, the size dispersion of the initial metallic catalyst droplets will be inherited and passed on to the as-grown SiNWs, and thus it has to be well-controlled for seeking a highly uniform and reliable fabrication (Figure b). Though many strategies have been adopted to tailor successfully the size of the catalyst droplets in the VLS growth approach, such as electron beam lithography (EBL) catalyst patterning and template assisted growth . Recently, we also explored the use of EBL to pattern narrow stripes of indium (In) catalyst, with initial width down to 100 nm, and found that this size confinement is beneficial for forming uniform rows of In droplets .…”
Section: Introductionmentioning
confidence: 99%