Advanced TXRF Analysis: Background Reduction when Measuring High-k Materials and Mapping Metallic Contamination

Sparks, Chris; Barnett, Joel; Michelson, Diane K.; Gondran, Carolyn F. H.; Song, Seung Chul; Martínez, Ángela Vivanco; Takahara, Hikari; Murakami, Hiroyuki; Kinashi, Toru

doi:10.4028/3-908451-46-9.285

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2008

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“…In this paper, an Ir-Lα X-ray source is applied to surface contamination analysis on hafnium silicate. The energy of Ir-Lα1, 9.18 keV, is slightly lower than conventional W-Lβ1 (9.77 keV) radiation, which does not cause Hf-L absorption (9.56 keV in Hf-LIII) and the corresponding emissions [4,5]. The spectral characteristics were investigated by intentional contamination with several transition metals on hafnium silicate film.…”

Section: Introductionmentioning

confidence: 99%